Bayraktar, M. and Bastiaens, H.M.J. and Bruineman, C. and Vratzov, B. and Bijkerk, F. (2016) Broadband transmission grating spectrometer for measuring the emission spectrum of EUV sources. NEVAC blad 54 . 14 - 19.
Bayraktar, M. and Chopra, A. and Rijnders, A.J.H.M. and Boller, K-J. and Bijkerk, F. (2016) Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts. In: SPIE Advanced Lithography Conference, 22-02-2015, San Jose, California.
Bayraktar, Muharrem (2015) Adaptive multilayer optics for extreme ultraviolet wavelengths. thesis.
Chopra, A. and Bayraktar, M. and Bijkerk, F. and Rijnders, A.J.H.M. (2015) Controlled growth of PbZr0.52Ti0.48O3 using nanosheet coated Si (001). Thin solid films, 589 . 13 - 16. ISSN 0040-6090
Bayraktar, M. and Chopra, A. and Bijkerk, F. and Rijnders, G. (2014) Nanosheet controlled epitaxial growth of PbZr0.52Ti0.48O3 thin films on glass substrates. Applied physics letters, 105 (13). 132904 -. ISSN 0003-6951
Bayraktar, M. and Chopra, A. and Rijnders, G. and Boller, K-J. and Bijkerk, F. (2014) Wavefront correction in the extreme ultraviolet wavelength range using piezoelectric thin films. Optics express, 22 (25). 30623 - 30632. ISSN 1094-4087
Bayraktar, M. and Goor, F.A. van and Boller, K-J. and Bijkerk, F. (2014) Spectral purification and infrared light recycling in extreme ultraviolet lithography sources. Optics express, 22 (7). 8633 - 8639. ISSN 1094-4087
Bayraktar, M. and Wessels, W.A. and Lee, C.J. and Goor, F.A. van and Koster, G. and Rijnders, G. and Bijkerk, F. (2012) Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths. Journal of physics D: applied physics, 45 (49). 494001-1 - 494001-5. ISSN 0022-3727
Dinger, U. and Bijkerk, F. and Bayraktar, M. and Dier, O. (2012) EUV mirror arrangement, optical system comprising EUV mirror arrangement and method for operating an optical system comprising an EUV mirror arrangement. Patent.