Author Publications

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Number of items: 38.

2014

Van Bui, H. and Nguyen, M.D. and Wiggers, F.B. and Aarnink, A.A.I. and Jong, M.P. de and Kovalgin, A.Y. (2014) Self-limiting growth and thickness- and temperature-dependence of optical constants of ALD AlN thin films. ECS journal of solid state science and technology, 3 (4). pp. 101-106. ISSN 2162-8769

Van Bui, H. and Wiggers, F.B. and Aarnink, A.A.I. and Nguyen, M.D. and Jong, M.P. de and Kovalgin, A.Y. and Gupta, A.Y. (2014) Growth characteristics, optical properties, and crystallinity of thermal and plasma-enhanced ALD AIN films. In: 14th International Conference on Atomic Layer Deposition, SLD 2014, 15-18 June 2014, Kyoto, Japan (pp. p. 113).

Van Bui, Hao and Wiggers, Frank B. and Gupta, Anubha and Nguyen, Minh D. and Aarnink, Antonius A.I. and Jong, Michel P. de and Kovalgin, Alexey Y. (2014) Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 33 . 01A111. ISSN 0734-2101

2013

Graaf, H. van der and Aarnink, A.A.I. and Aarts, A. and Bakel, N. van and Berbee, E. and Berkien, A. and Beuzekom, M. van and Bosma, M. and Campbell, M. and Chefdeville, M.A. and Colas, P. and Colijn, A.-P. and Fomaini, A. and Fransen, M. and Giganon, A. and Giomataris, I. and Gotink, W. and Groot, N. de and Hartjes, F. and Heijden, B. van der and Hessey, N. and Jansweijer, P. and Konig, A. and Koppert, W. and Llopart, X. and Nooij, L. de and Putten, S. van der and Rövekamp, J. and Salm, C. and San Segundo Bello, D. and Schmitz, J. and Smits, S.M. and Timmermans, J. and Verkooijen, H. and Visschers, J. and Visser, J. and Wijnen, T. and Wyrsch, N. (2013) The gridpix detector: history and perspective. Modern Physics Letters A, 28 (28-13). pp. 13400211-13400217. ISSN 0217-7323

Kovalgin, Alexey Y. and Aarnink, Antonius A.I. (2013) Semiconductor processing apparatus with compact free radical source. Patent.

Spruijtenburg, Paul C. and Ridderbos, Joost and Mueller, Filipp and Leenstra, Anne W. and Brauns, M and Aarnink, Antonius A.I. and Wiel, Wilfred G. van der and Zwanenburg, Floris A. (2013) Single-hole tunneling through a two-dimensional hole gas in intrinsic silicon. Applied physics letters, 102 (19). p. 192105. ISSN 0003-6951

Van Bui, H. and Aarnink, A.A.I. and Jong, M.P. de and Kovalgin, A.Y. (2013) In situ spectroscopic ellipsometry for studying the growth and optical constants of ALD AlN films. NEVAC Blad, 51 (3). pp. 24-31. ISSN 0169-9431

Van Bui, H. and Kovalgin, A.Y. and Aarnink, A.A.I. and Wolters, R.A.M. (2013) Hot-Wire generated atomic hydrogen and its impact on thermal ALD in $TiCl_4/NH_3$ system. ECS journal of solid state science and technology, 2 (4). pp. 149-155. ISSN 2162-8777

2012

Kazmi, S.N.R. and Kovalgin, A.Y. and Aarnink, A.A.I. and Salm, C. and Schmitz, J. (2012) Low-stress highly-conductive in-situ boron doped Ge$_{0.7}$Si$_{0.3}$ films by LPCVD. ECS journal of solid state science and technology, 1 (5). P222-P226. ISSN 2162-8777

Kazmi, Syed Naveed Riaz and Aarnink, Tom and Salm, Cora and Schmitz, Jurriaan (2012) CMOS-MEMS Post Processing Compatible Capacitively Transduced GeSi Resonators. In: Proceedings of 2012 IEEE International Frequency Control Symposium (IFCS) , 21-24 May 2012, Baltimore, USA (pp. pp. 1-4).

2011

Kazmi, S.N.R. and Aarnink, A.A.I. and Kovalgin, A.Y. and Salm, C. and Schmitz, J. (2011) Low Stress In Situ Boron Doped Poly SiGe Layers for MEMS Modular Integration with CMOS. ECS Transactions, 35 (30). pp. 45-52. ISSN 1938-5862

Van Bui, H. and Groenland, A.W. and Aarnink, A.A.I. and Wolters, R.A.M. and Schmitz, J. and Kovalgin, A.Y. (2011) Growth Kinetics and Oxidation Mechanism of ALD TiN Thin Films Monitored by In Situ Spectroscopic Ellipsometry. Journal of the Electrochemical Society, 158 . pp. 214-220. ISSN 0013-4651

Van Bui, H. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. (2011) Ultra-Thin Atomic Layer Deposited TiN Films: Non-Linear I–V Behaviour and the Importance of Surface Passivation. Journal of Nanoscience and Nanotechnology, 11 (9). pp. 8120-8125. ISSN 1533-4880

2010

Kaleli, B. and Aarnink, A.A.I. and Smits, S.M. and Hueting, R.J.E. and Wolters, R.A.M. and Schmitz, J. (2010) Electron Beam Lithography of HSQ and PMMA Resists and Importance of their Properties to Link the Nano World to the Micro World. In: STW.ICT Conference 2010, 18-19 Nov 2010, Veldhoven, The Netherlands (pp. pp. 105-108).

Kazmi, S.N.R. and Rangarajan, B. and Aarnink, T. and Salm, C. and Schmitz, J. (2010) Low Stressed In-situ Boron doped Poly SiGe Layers for High-Q Resonators. In: STW.ICT Conference 2010, 18-19 Nov 2010, Veldhoven, The Netherlands (pp. pp. 109-113).

2009

Aarnink, A.A.I. and Van Bui, H. and Kovalgin, A.Y. and Wolters, R.A.M. (2009) In-situ monitoring of growth and oxidation of ALD TiN layers followed by reduction in atomic hydrogen. In: 9th International Conference on Atomic Layer Deposition, 19-22 July 2009, Monterey, CA, USA.

Brunets, I. and Boogaard, A. and Smits, S.M. and Vries, H. de and Aarnink, A.A.I. and Holleman, J. and Kovalgin, A.Y. and Schmitz, J. (2009) Low temperature TFTs with poly-stripes. In: Proceedings of the 5th International Thin Film Transistor Conference ITC'09, 5-6 Mar 2009, Palaiseau, France (pp. pp. 62-65).

Kovalgin, A.Y. and Boogaard, A. and Brunets, I. and Aarnink, A.A.I. and Wolters, R.A.M. (2009) Electrical properties of plasma-deposited silicon oxide clarified by chemical modeling. ECS Transactions, 25 (8). pp. 23-32. ISSN 1938-5862

Rajasekharan, B. and Salm, C. and Wolters, R.A.M. and Aarnink, A.A.I. and Boogaard, A. and Schmitz, J. (2009) Metal contacts to lowly doped Si and ultra thin SOI. In: Proceedings of Fifth Workshop of the Thematic Network on Silicon on Insulator Technology, Devices and Circuits, 19-21 Jan 2009, Gotheburg, Sweden (pp. pp. 29-30).

Van Bui, Hao and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Schmitz, J. (2009) Thermal atomic layer deposition and oxidation of TiN monitored by in-situ spectroscopic ellipsometry. In: 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE, 26-27 November 2009, Veldhoven, The Netherlands (pp. pp. 59-62).

2008

Boogaard, A. and Roesthuis, R. and Brunets, I. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2008) Deposition of High-Quality SiO2 Insulating Films at Low Temperatures by means of Remote PECVD. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands (pp. pp. 452-456).

Brunets, I. and Groenland, A.W. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. (2008) A study of thermal oxidation and plasma-enhanced oxidation/reduction of ALD TiN layers. In: 18th International Conference on Atomical Layer Deposition, ALD 2008, 29 June - 2 July 2008, Bruges, Belgium (pp. P-54).

Brunets, I. and Loon, R.V.A. van and Walters, R.J. and Polman, A. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2008) Light emission from silicon nanocrystals embedded in ALD-alumina at low temperatures. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands (pp. pp. 399-402).

Groenland, A.W. and Brunets, I. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Schmitz, J. (2008) Thermal and plasma-enhanced oxidation of ALD TiN. In: 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2008, 27-28 November 2008, Veldhoven, The Netherlands (pp. pp. 468-471).

2007

Boogaard, A. and Kovalgin, A.Y. and Brunets, I. and Aarnink, A.A.I. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2007) Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD. Surface & Coatings Technology, 201 (22-23). pp. 8976-8980. ISSN 0257-8972

Boogaard, A. and Kovalgin, A.Y. and Brunets, I. and Aarnink, A.A.I. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) On the verification of EEDFs in plasmas with silane using optical emission spectroscopy. ECS Transactions, 6 (1). pp. 259-270. ISSN 1938-5862

Brunets, I. and Aarnink, A.A.I. and Boogaard, A. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) Low-temperature LPCVD of Si nanocrystals from disilane and trisilane (Silcore®) embedded in ALD-alumina for non-volatile memory devices. Surface & Coatings Technology, 201 . pp. 9209-9214. ISSN 0257-8972

Brunets, I. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) Low-temperature process steps for realization of non-volatile memory devices. In: 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), 29-30 Nov 2007, Veldhoven, The Netherlands (pp. pp. 504-508).

2006

Blanco Carballo, V.M. and Chefdeville, M. and Graaf, H. van der and Salm, C. and Aarnink, A.A.I. and Smits, S.M. and Altpeter, D.M. and Timmermans, J. and Visschers, J.L. and Schmitz, J. (2006) A miniaturized multiwire proportional chamber using CMOS wafer scale post-processing. In: 32nd European Solid State Device Research Conference, 02-06 July 2006, Montreux, Switzerland (pp. pp. 129-132).

Boogaard, A. and Kovalgin, A.Y. and Aarnink, A.A.I. and Wolters, R.A.M. and Holleman, J. and Brunets, I. and Schmitz, J. (2006) Measurement of electron temperatures of Argon Plasmas in a High-Density Inductively-Coupled Remote Plasma System by Langmuir Probe and Optical-Emission Spectroscopy. In: Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006, 23-24 Nov 2006, Veldhoven, The Netherlands (pp. pp. 412-418).

Boogaard, Arjen and Kovalgin, Alexey and Aarnink, Tom and Wolters, Rob and Holleman, Jisk and Brunets, Ihor and Schmitz, Jurriaan (2006) Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD. ECS Transactions, 2 (7). pp. 181-191. ISSN 1938-5862

Brunets, I. and Hemert, T. van and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Schmitz, J. (2006) Memory devices with encapsulated Si nano-crystals: Realization and Characterization. In: Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006, 23-24 Nov 2006, Veldhoven, The Netherlands (pp. pp. 419-422).

Brunets, Ihor and Holleman, Jisk and Kovalgin, Alexey Y. and Aarnink, Tom and Boogaard, Arjen and Oesterlin, Peter (2006) Green Laser Crystallization of a-Si Films Using Preformed a-Si Lines. ECS Transactions, 3 (8). pp. 185-191. ISSN 1938-5862

2005

Aarnink, A.A.I. and Boogaard, A. and Brunets, I. and Isai, I.G. and Kovalgin, A.Y. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2005) A high-density inductively-coupled remote plasma system for the deposition of dielectrics and semiconductors. In: 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005 (SAFE 2005), 17-18 November 2005, Veldhoven, the Netherlands (pp. pp. 67-69).

Brunets, I. and Boogaard, A. and Isai, I.G. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Schmitz, J. (2005) Three-dimensional IC's prolong the life of Moore's law. In: 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005 (SAFE 2005), 17-18 November 2005, Veldhoven, the Netherlands (pp. pp. 76-78).

Bystrova, S. and Holleman, J. and Aarnink, A.A.I. and Wolters, R.A.M. (2005) Barrier properties of ALD1,5N thin films. In: International Conference on Advanced Metallization, 19-21 October 2004, San Diego, California, USA (pp. pp. 769-774).

2003

Bankras, R.G. and Aarnink, A.A.I. and Holleman, J. and Schmitz, J. (2003) In-situ RHEED analysis of atomic layer deposition and characterization of AL203 gate dielectrics. In: 6th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2003, 25-26 November 2003, Veldhoven, The Netherlands (pp. pp. 726-729).

Bystrova, S. and Holleman, J. and Wolters, R.A.M. and Aarnink, A.A.I. (2003) Atomic layer deposition of W - based layers on SiO2. In: 6th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2003, 25-26 November 2003, Veldhoven, The Netherlands (pp. pp. 730-734).

This list was generated on Wed Dec 17 05:16:11 2014 CET.