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Article

Astakhov, D. and Goedheer, W.J. and Lee, C.J. and Ivanov, V.V. and Krivtsun, V.M. and Zotovich, A.I. and Zyryanov, S.M. and Lopaev, D. and Bijkerk, F. (2015) Plasma probe characteristics in low density hydrogen pulsed plasmas. Plasma sources science and technology, 24 (5). 1 - 10. ISSN 0963-0252

Bayraktar, M. and Chopra, A. and Bijkerk, F. and Rijnders, G. (2014) Nanosheet controlled epitaxial growth of PbZr0.52Ti0.48O3 thin films on glass substrates. Applied physics letters, 105 (13). 132904 -. ISSN 0003-6951

Bayraktar, M. and Chopra, A. and Rijnders, G. and Boller, K-J. and Bijkerk, F. (2014) Wavefront correction in the extreme ultraviolet wavelength range using piezoelectric thin films. Optics express, 22 (25). 30623 - 30632. ISSN 1094-4087

Bayraktar, M. and Goor, F.A. van and Boller, K-J. and Bijkerk, F. (2014) Spectral purification and infrared light recycling in extreme ultraviolet lithography sources. Optics express, 22 (7). 8633 - 8639. ISSN 1094-4087

Bayraktar, M. and Wessels, W.A. and Lee, C.J. and Goor, F.A. van and Koster, G. and Rijnders, G. and Bijkerk, F. (2012) Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths. Journal of physics D: applied physics, 45 (49). 494001-1 - 494001-5. ISSN 0022-3727

Boogaard, A.J.R. van den and Goor, F.A. van and Louis, E. and Bijkerk, F. (2012) Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection. Optics letters, 37 (2). 160 - 162. ISSN 0146-9592

Boogaard, A.J.R. van den and Louis, E. and Zoethout, E. and Müllender, S. and Bijkerk, F. (2010) Surface morphology of Kr+-polished amorphous Si layers. Journal of vacuum science & technology A: Vacuum, surfaces, and films, 28 (4). p. 552. ISSN 0734-2101

Boogaard, A.J.R. van den and Zoethout, E. and Makhotkin, I.A. and Louis, E. and Bijkerk, F. (2012) Influence of noble gas ion polishing species on extreme ultraviolet mirrors. Journal of applied physics, 112 (12). ISSN 0021-8979

Bosgra, J. and Veldhuizen, L.W. and Zoethout, E. and Verhoeven, J. and Loch, R.A. and Yakshin, A. and Bijkerk, F. (2013) Interactions of C in layered Mo–Si structures. Thin Solid Films, 542 . 210 - 213. ISSN 0040-6090

Bosgra, J. and Verhoeven, J. and Kruijs, R.W.E. van de and Yakshin, A. and Bijkerk, F. (2012) Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth. Thin solid films, 522 . 228 - 232. ISSN 0040-6090

Bosgra, J. and Zoethout, E. and Eerden, A.M.J. and Verhoeven, J. and Kruijs, R.W.E. van de and Yakshin, A. and Bijkerk, F. (2012) Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors. Applied optics, 51 (36). 8541 - 8548. ISSN 0003-6935

Bruijn, S. and Kruijs, R.W.E. van de and Yakshin, A. and Bijkerk, F. (2012) Ion assisted growth of B4C diffusion barrier layers in Mo/Si multilayered structures. Journal of applied physics, 111 (6). 064303-1. ISSN 0021-8979

Bruijn, S. and Kruijs, R.W.E. van de and Yakshin, A.E. and Zoethout, E. and Bijkerk, F. (2010) Thermally induced decomposition of B4C barrier layers in Mo/Si multilayer structures. Surface and Coatings Technology, 205 (7). pp. 2469-2473. ISSN 0257-8972

Chen, Juequan and Louis, Eric and Verhoeven, Jan and Harmsen, Rob and Lee, Chris J. and Lubomska, Monika and Kampen, Maarten van and Schaik, Willem van and Bijkerk, Fred (2010) Secondary electron yield measurements of carbon covered multilayer optics. Applied Surface Science, 257 (2). pp. 354-361. ISSN 0169-4332

Chen, Juequan and Louis, Eric and Wormeester, Herbert and Harmsen, Rob and Kruijs, Robbert van de and Lee, Chris J. and Schaik, Willem van and Bijkerk, Fred (2011) Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science and Technology, 22 (10). p. 105705. ISSN 0957-0233

Chopra, A. and Bayraktar, M. and Bijkerk, F. and Rijnders, A.J.H.M. (2015) Controlled growth of PbZr0.52Ti0.48O3 using nanosheet coated Si (001). Thin solid films, 589 . 13 - 16. ISSN 0040-6090

Coloma Ribera, R. and Kruijs, R.W.E. van de and Kokke, S. and Zoethout, E. and Yakshin, A.E. and Bijkerk, F. (2014) Surface and sub-surface thermal oxidation of thin ruthenium films. Applied physics letters, 105 (13). 131601 -. ISSN 0003-6951

Coloma Ribera, R. and Kruijs, R.W.E. van de and Sturm, J.M. and Yakshin, A.E. and Bijkerk, F. (2016) In vacuo growth studies of Ru thin films on Si, SiN, and SiO2 by high-sensitivity low energy ion scattering. Journal of applied physics, 120 (6). 065303. ISSN 0021-8979

Coloma Ribera, R. and Kruijs, R.W.E. van de and Yakshin, A. and Bijkerk, F. (2015) Determination of oxygen diffusion kinetics during thin film ruthenium oxidation. Journal of applied physics, 118 . 055303. ISSN 0021-8979

Dobrovolskiy, S. and Yakshin, A.E. and Tichelaar, F.D. and Verhoeven, J. and Louis, E. and Bijkerk, F. (2010) Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing. Nuclear Instruments and Methods in Physics Research. Section B: Beam interactions with materials and atoms, 268 (6). pp. 560-567. ISSN 0168-583X

Dolgov, A. and Lopaev, D. and Lee, C.J. and Zoethout, E. and Medvedev, V.V. and Yakushev, O. and Bijkerk, F. (2015) Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source. Applied surface science, 353 . 708 - 713. ISSN 0169-4332

Dolgov, A. and Lopaev, D. and Rachimova, T. and Kovalev, A. and Vasilyeva, A. and Lee, C.J. and Krivtsun, V.M. and Yakushev, O. and Bijkerk, F. (2014) Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas. Journal of physics D: applied physics, 47 (6). ISSN 0022-3727

Dolgov, A. and Yakushev, O. and Abrikosov, A. and Snegirev, E. and Krivtsun, V.M. and Lee, C.J. and Bijkerk, F. (2015) Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes. Plasma sources science and technology, 24 (3). 035003. ISSN 0963-0252

Gao, A. and Lee, C.J. and Bijkerk, F. (2014) Graphene defect formation by extreme ultraviolet generated photoelectrons. Journal of applied physics, 116 (5). ISSN 0021-8979

Gao, A. and Rizo, P.J. and Scaccabarozzi, L. and Lee, C.J. and Banine, V.Y. and Bijkerk, F. (2015) Photoluminescence-based detection of particle contamination on extreme ultraviolet reticles. Review of scientific instruments, 86 (063109). ISSN 0034-6748

Gao, A. and Rizo, P.J. and Zoethout, E. and Scaccabarozzi, L. and Lee, C.J. and Banine, V. and Bijkerk, F. (2013) Extreme Ultraviolet (EUV) induced defects on few-layer graphene. Journal of applied physics, 114 (4). ISSN 0021-8979

Gao, A. and Zoethout, E. and Sturm, J.M. and Lee, C.J. and Bijkerk, F. (2014) Defect formation in single layer graphene under extreme ultraviolet irradiation. Applied surface science, 317 . 745 - 751. ISSN 0169-4332

Goh, S.J. and Bastiaens, H.J.M. and Vratzov, B. and Huang, Q. and Bijkerk, F. and Boller, K-J. (2015) Fabrication and characterization of free-standing, high-line-density transmission gratings for the vacuum UV to soft X-ray range. Optics express, 23 (4). 4421 - 4434. ISSN 1094-4087

Goh, S.J. and Bastiaens, H.J.M. and Vratzov, B. and Huang, Q. and Bijkerk, F. and Boller, K-J. (2015) Fabrication and characterization of free-standing, high-line-density transmission gratings for the vacuum UV to soft X-ray range. Virtual journal for biomedical optics, 10 (3). 4421 - 4434. ISSN 1931-1532

Gou, F. and Gleeson, M.A. and Kleyn, A.W. and Kruijs, R.W.E. van de and Yakshin, A.E. and Bijkerk, F. (2009) Growth of silicon nitride films by bombarding amorphous silicon with N+ ions: MD simulation. Nuclear Instruments and Methods in Physics Research. Section B: Beam interactions with materials and atoms, 267 (18). pp. 3245-3248. ISSN 0168-583X

Huang, Q. and Paardekooper, D.M. and Zoethout, E. and Medvedev, V.V. and Kruijs, R.W.E. van de and Bosgra, J. and Louis, E. and Bijkerk, F. (2014) UV spectral filtering by surface structures multilayer mirrors. Optics letters, 39 (5). 1185 - 1188. ISSN 0146-9592

Huber, S.P. and Kruijs, R.W.E. van de and Yakshin, A.E. and Zoethout, E. and Boller, Klaus-J. and Bijkerk, F. (2014) Subwavelength single layer absorption resonance antireflection coatings. Optics express, 22 (1). 490 - 497. ISSN 1094-4087

Khorsand, A.R. and Sobierajski, R. and Louis, E. and ........, .... and Gleeson, A. and Gullikson, E.M. and Bijkerk, F. (2010) Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure. Optics Express, 18 (2). p. 700. ISSN 1094-4087

Kozhevnikov, I.V. and Meer, R. van der and Bastiaens, H.M.J. and Boller, K.-J. and Bijkerk, F. (2010) High-resolution, high-reflectivity operation of lamellar multilayer amplitude gratings: identification of the single-order regime. Optics Express, 18 (15). pp. 16234-16242. ISSN 1094-4087

Kozhevnikov, I.V. and Meer, R. van der and Bastiaens, H.M.J. and Boller, K.-J. and Bijkerk, F. (2011) Analytic theory of soft x-ray diffraction by lamellar multilayer gratings. Optics Express, 19 (10). pp. 9172-9184. ISSN 1094-4087

Kozhevnikov, I.V. and Yakshin, A. and Bijkerk, F. (2015) Wideband multilayer mirrors with minimal layer thicknesses variation. Optics express, 23 (7). 9276 - 9283. ISSN 1094-4087

Kuznetsov, A. and Gleeson, M.A. and Bijkerk, F. (2013) Hydrogen-induced blistering of Mo/Si multilayers: Uptake and distribution. Thin solid films, 545 . 571 - 579. ISSN 0040-6090

Kuznetsov, A. and Gleeson, M.A. and Bijkerk, F. (2013) Ion effects in hydrogen-induced blistering of Mo/Si multilayers. Journal of applied physics, 114 (11). 113507-1 - 113507-12. ISSN 0021-8979

Kuznetsov, A. and Gleeson, M.A. and Bijkerk, F. (2012) Hydrogen-induced blistering mechanisms in thin film coatings. Journal of physics: Condensed matter, 24 (5). ISSN 0953-8984

Kuznetsov, A. and Stuik, R. and Bijkerk, F. and Shevelko, A.P. (2012) Spectral and spatial structure of extreme ultraviolet radiation in laser plasma-wall interactions. Plasma physics and controlled fusion, 54 (8). 1 - 6. ISSN 0741-3335

Kuznetsov, A.S. and Kruijs, R.W.E. van de and Gleeson, M.A. and Schmid, K. and Bijkerk, F. (2010) Hydrogen interaction with EUVL-relevant optical materials. Journal of Surface Investigation. X-ay, Synchrotron and Neutron Techniques, 4 (4). pp. 563-566. ISSN 1027-4510

Kuznetsov, Alexey Sergeevich and Gleeson, M.A. and Bijkerk, F. (2014) Temperature dependencies of hydrogen- induced blistering of thin film multilayers. Journal of applied physics, 115 (173510). ISSN 0021-8979

Kuznetsov, D. and Yakshin, A. and Sturm, J.M. and Kruijs, R.W.E. van de and Louis, E. and Bijkerk, F. (2015) High-reflectance La/B-based multilayer mirror for 6.x  nm wavelength. Optics letters, 40 (16). 3378 - 3781. ISSN 0146-9592

Liu, F. and Lee, C.J. and Chen, J. and Louis, E. and Slot, P.J.M. van der and Boller, K-J. and Bijkerk, F. (2012) Correction to article “Ellipsometry with randomly varying polarization states”. Optics express, 20 (28). 29308 - 29308. ISSN 1094-4087

Liu, F. and Sturm, J.M. and Lee, C.J. and Bijkerk, F. (2016) Extreme UV induced dissociation of amorphous solid water and crystalline water bilayers on Ru(0001). Surface science, 646 . 101 - 107. ISSN 0039-6028

Liu, F. and Lee, C.J. and Chen, J. and Louis, E. and Slot, P.J.M. van der and Boller, K-J. and Bijkerk, F. (2012) Ellipsometry with randomly varying polarization states. Optics express, 20 (2). 870 - 878. ISSN 1094-4087

Loch, R.A. and Levy, A. and Ceccotti, T. and Quere, F. and Thaury, C. and George, H. and Bijkerk, F. and Boller, K.-J. and Martin, Ph. (2009) Enhanced ion acceleration with extremely thin foils. European physical journal. Special topics, 175 (1). pp. 133-138. ISSN 1951-6355

Loch, R.A. and Ceccotti, T. and Quere, F. and George, H. and Bonnaud, G. and Réau, F. and D'Oliviera, P. and Luttikhof, M.J.H. and Bijkerk, F. and Boller, K-J. and Blaclard, G. and Combis, P. (2016) Ion acceleration in the transparent regime and the critical influence of the plasma density scale length. Physics of plasmas, 23 (093117). ISSN 1070-664X

Loch, R.A. and Sobierajski, R. and Louis, E. and Bosgra, J. and Bijkerk, F. (2012) Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources. Optics express, 20 (27). 28200 - 28215. ISSN 1094-4087

Lui, F. and Lee, C.J. and Chen, J. and Louis, E. and Slot, P.J.M. van der and Boller, K-J. and Bijkerk, F. (2012) Ellipsometry with an undetermined polarization state. Optics express, 20 (2). 870 - 878. ISSN 1094-4087

Makhotkin, I.A. and Zameshin, A. and Kruijs, R.W.E. van de and Yakshin, A. and Bijkerk, F. (2015) Characterization of nanoscale multilayer structures upon thermal annealing. Proceedings of SPIE - the international society for optical engineering, 9510 . ISSN 0277-786X

Makhotkin, I.A. and Zoethout, E. and Louis, E. and Yakunin, A.M. and Muellender, S. and Bijkerk, F. (2012) Wavelength selection for multilayer coatings for the lithography generation beyond extreme ultraviolet. Journal of micro/nanolithography, MEMS, and MOEMS, 11 (4). 040501-1 - 040501-3. ISSN 1932-5150

Makhotkin, I.A. and Zoethout, E. and Louis, E. and Yakunin, A.M. and Muellender, S. and Bijkerk, F. (2012) Spectral properties of La/B - Based multilayer mirrors near the boron K absorption edge. Optics express, 20 (11). 11778 - 11786. ISSN 1094-4087

Medvedev, V.V. and Boogaard, A.J.R. van den and Meer, R. van der and Yakshin, A. and Krivtsun, V.M. and Louis, E. and Bijkerk, F. (2013) Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors. Optics express, 21 (14). 16964 - 16974. ISSN 1094-4087

Medvedev, V.V. and Kruijs, R.W.E. van de and Yakshin, A. and Novikova, N.N. and Krivtsun, V.M. and Yakunin, A.M. and Bijkerk, F. (2013) Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography. Applied physics letters, 103 (22). 221114-1 - 21114-4. ISSN 0003-6951

Medvedev, V.V. and Yakshin, A. and Kruijs, R.W.E. van de and Krivtsun, V.M. and Yakunin, A.M. and Koshelev, K.N. and Bijkerk, F. (2012) Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors. Optics letters, 37 (7). 1169 - 1171. ISSN 0146-9592

Medvedev, V.V. and Yakshin, A. and Kruijs, R.W.E. van de and Krivtsun, V.M. and Yakunin, A.M. and Koshelev, K.N. and Bijkerk, F. (2012) Infrared antifreflective filtering for extreme ultraviolet multilayer Bragg reflectors. Optics letters, 37 (7). 1169 - 1171. ISSN 0146-9592

Medvedev, V.V. and Yakshin, A.E. and Kruijs, R.W.E. van de and Bijkerk, F. (2015) Phosphorus-based compounds for EUV multilayer optics materials. Optical materials express, 5 (6). 1450 - 1459. ISSN 2159-3930

Medvedev, V.V. and Yang, J. and Schmidt, A.J. and Yakshin, A. and Kruijs, R.W.E. van de and Zoethout, E. and Bijkerk, F. (2015) Anisotropy of heat conduction in Mo/Si multilayers. Journal of applied physics, 118 (8). ISSN 0021-8979

Meer, R. van der and Kozhevnikov, I.V. and Bastiaens, H.M.J. and Boller, K-J. and Bijkerk, F. (2013) Extended theory of soft x-ray reflection for realistic lamellar multilayer gratings. Optics express, 21 (11). 13105 - 13117. ISSN 1094-4087

Meer, R. van der and Kozhevnikov, I.V. and Krishnan, B. and Huskens, J. and Hegeman, P.E. and Brons, C. and Vratzov, B. and Bastiaens, H.M.J. and Boller, K-J. and Bijkerk, F. (2013) Single-order operation of lamellar multilayer gratings in the soft x-ray spectral range. AIP advances, 3 (1). 012103 - 012109. ISSN 2158-3226

Nyabero, S.L. and Kruijs, R.W.E. van de and Yakshin, A. and Bijkerk, F. (2013) Enhanced thermal stability of extreme ultraviolet multilayers by balancing diffusion-induced structural changes. Applied physics letters, 103 (9). ISSN 0003-6951

Nyabero, S.L. and Kruijs, R.W.E. van de and Yakshin, A. and Makhotkin, I.A. and Bosgra, J. and Bijkerk, F. (2014) Diffusion-induced structural changes in La/B-based multilayers for 6.7-nm radiation. Journal of micro/nanolithography, MEMS, and MOEMS, 13 (1). 013014 - 013014-5. ISSN 1932-5150

Nyabero, S.L. and Kruijs, R.W.E. van de and Yakshin, A. and Zoethout, E. and Bijkerk, F. (2012) Thermally induced interface chemistry in Mo/B 4C/Si/B 4C multilayered films. Journal of applied physics, 112 (5). 054317-1. ISSN 0021-8979

Nyabero, S.L. and Kruijs, R.W.E. van de and Yakshin, A. and Zoethout, E. and Blanckenhage, G. von and Bosgra, J. and Loch, R.A. and Bijkerk, F. (2013) Interlayer growth in Mo/B4C multilayered structures upon thermal annealing. Journal of applied physics, 113 (14). 144310-1 - 144310-6. ISSN 0021-8979

Pachecka, M. and Sturm, J.M. and Kruijs, R.W.E. van de and Lee, C.J. and Bijkerk, F. (2016) Electronegativity-dependent tin etching from thin films. AIP advances, 6 (7). ISSN 2158-3226

Rooij-Lohmann, V.I.T.A. de and Kozhevnikov, I.V. and Peverini, L. and Ziegler, E. and Cuerno, R. and Bijkerk, F. and Yakshin, A.E. (2010) Roughness evolution of Si surfaces upon Ar ion erosion. Applied Surface Science, 256 (16). pp. 5011-5014. ISSN 0169-4332

Rooij-Lohmann, V.I.T.A. de and Kleyn, A.W. and Bijkerk, F. and Brongersma, H.H. and Yakshin, A.E. (2009) Diffusion and interaction studied nondestructively and in real-time with depth-resolved low energy ion spectroscopy. Applied Physics Letters, 94 (063107). 063107. ISSN 0003-6951

Rooij-Lohmann, V.I.T.A. de and Yakshin, A.E. and Kruijs, R.W.E. van de and Zoethout, E. and Kleyn, A.W. and Keim, E.G. and Gorgoi, M. and Schäfers, F. and Brongersma, H.H. and Bijkerk, F. (2010) Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems. Journal of Applied Physics, 108 (1). 014314. ISSN 0021-8979

Sobierajski, R. and Loch, R.A. and Kruijs, R.W.E. van de and Louis, E. and Blanckenhagen, G. von and Gullikson, E.M. and Siewert, F. and Wawro, A. and Bijkerk, F. (2013) Mo/Si multilayer-coated amplitude division beam splitters for XUV radiation sources. Journal of synchrotron radiation, 20 (2). 249 - 257. ISSN 0909-0495

Sturm, J.M. and Liu, F. and Grecea, M.L. and Gleeson, M.A. and Lee, C.J. and Bijkerk, F. (2013) UHV-opstelling voor het bestuderen van de contaminatie van EUV-spiegels. NEVAC blad, 5 (1). 12 - 15. ISSN 0169-9431

Tsarfati, Tim and Zoethout, Erwin and Kruijs, Robbert van de and Bijkerk, F. (2009) Chemically mediated diffusion of d-metals and B through Si and agglomeration at Si-on-Mo interfaces. Journal of applied physics, 105 (104305). p. 104305. ISSN 0021-8979

Tsarfati, T. and Kruijs, R.W.E. van de and Zoethout, E. and Bijkerk, F. (2010) Nitridation and contrast of B4C/La interfaces and X-ray multilayer optics. Thin Solid Films, 518 (24). pp. 7249-7252. ISSN 0040-6090

Tsarfati, T. and Kruijs, R.W.E. van de and Zoethout, E. and Louis, E. and Bijkerk, F. (2009) Reflective multilayer optics for 6.7 nm wavelength radiation sources and next generation lithography. Thin Solid Films, 518 (5). pp. 1365-1368. ISSN 0040-6090

Tsarfati, T. and Zoethout, E. and Kruijs, R.W.E. van de and Bijkerk, F. (2009) Atomic O and H exposure of C-covered and oxidized d-metal surfaces. Surface Science, 603 (16). pp. 2594-2599. ISSN 0039-6028

Tsarfati, Tim and Zoethout, Erwin and Kruijs, Robbert van de and Bijkerk, Fred (2009) Growth and sacrificial oxidation of transition metal nanolayers. Surface Science Letters, 603 (7). pp. 1041-1045. ISSN 0167-2584

Tsarfati, Tim and Zoethout, Erwin and Kruijs, Robbert van de and Bijkerk, Fred (2009) In-depth agglomeration of d-metals at Si-on-Mo interfaces. Journal of Applied Physics, 105 (06). 064314. ISSN 0021-8979

Wu, Shiou-Min and Kruijs, Robbert van de and Zoethout, Erwin and Bijkerk, Fred (2009) Sputtering yields of Ru, Mo, and Si under low energy Ar+ bombardment. Journal of applied physics, 106 (054902). 054902. ISSN 0021-8979

Yakshin, A.E. and Kozhevnikov, I.V. and Zoethout, E. and Louis, E. and Bijkerk, F. (2010) Properties of broadband depth-graded multilayer mirrors for EUV optical systems. Optics Express, 18 (7). pp. 6957-6971. ISSN 1094-4087

Yakunin, S.N. and Makhotkin, I.A. and Chuev, M.A. and Pashaev, E.M. and Zoethout, E. and Louis, E. and Kruijs, R.W.E. van de and Seregin, S.Y. and Subbotin, I.A. and Novikov, D. and Bijkerk, F. and Kovalchuk, M.V. (2014) Model independent X-ray standing wave analysis of periodic multilayer structures. Journal of applied physics, 115 (13). ISSN 0021-8979

Yakunin, S.N. and Makhotkin, I.A. and Nikolaev, K.V. and Kruijs, R.W.E. van de and Chuev, M.A. and Bijkerk, F. (2014) Combined EUV reflectance and X-ray reflectivity data analysis of periodic multilayer structures. Optics express, 22 (17). 20076 - 20086. ISSN 1094-4087

Zameshin, Andrey and Makhotkin, Igor A. and Yakunin, Sergey N. and Kruijs, Robbert W.E. van de and Yakshin, Andrey E. and Bijkerk, F. (2016) Reconstruction of interfaces of periodic multilayers from X-ray reflectivity using a free-form approach. Journal of applied crystallography, 49 (4). 1300 - 1307. ISSN 0021-8898

Zoethout, E. and Louis, E. and Bijkerk, F. (2013) Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films. Applied surface science, 285 (Part B). 293 - 299. ISSN 0169-4332

Zwol, P.J. van and Vles, D.F. and Voorthuijzen, W.P. and Péter, M. and Vermeulen, H. and Zande, W.J. and Sturm, J.M. and Kruijs, R.W.E. van de and Bijkerk, F. (2015) Emissivity of freestanding membranes with thin metal coatings. Journal of applied physics, 118 . p. 213107. ISSN 0021-8979

Article News

Veen, W. van der and Bijkerk, F. (2012) Spiegeling en Daad. Universiteit Twente / Magazine voor alumni en relaties . 32 - 33.

Book Section

Boogaard, A.J.R. van den and Louis, E. and Goor, F.A. van and Bijkerk, Fred (2009) Optical element for full spectral purity from IR-generated EUV light sources. In: Frank M. Schellenberg & Bruno M. La Fontaine (Eds.), Alternative Lithographic Technologies. Proceedings of SPIE, 7271 . SPIE, 72713B. ISBN 9780819475244

Louis, E. and Hattum, E.D. van and Westen, S. Alonso van der and Salle, P. and Grootkarzijn, K.T. and Zoethout, E. and Bijkerk, F. and Blanckenhagen, G. von and Müllender, S. (2010) High reflectance multilayers for EUVL HVM-projection optics. In: Bruno M. la Fontaine (Ed.), Extreme Ultraviolet (EUV) Lithography. Proceedings of SPIE, 7636 . SPIE--The International Society for Optical Engineering, 76362T. ISBN 9780819480507

Tsarfati, Tim and Zoethout, Erwin and Louis, Eric and Kruijs, Robbert van de and Yakshin, Andrey and Müllender, Stephan and Bijkerk, Fred (2009) Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the extreme UV. In: Frank M. Schellenberg & Bruno M. La Fontaine (Eds.), Alternative Lithographic Technologies. Proceedings of SPIE, 7271 . SPIE, 72713V. ISBN 9780819475244

Conference or Workshop Item

Barreaux, J.L.P. and Bastiaens, H.M.J. and Kozhevnikov, I.V. and Bijkerk, F. and Boller, K-J. (2014) Narrow-band Borrmann multilayer filters for monitoring of EUV sources. In: Nanocity 2014, 14-10-2014 - 16-10-2014, Utrecht.

Barreaux, J.L.P. and Kozhevnikov, I.V. and Bastiaens, H.M.J. and Kruijs, R.W.E. van de and Bijkerk, F. and Boller, K-J. (2015) Multilayer Filter Using the Borrmann Effect for EUV Source Monitoring. In: CLEO/Europe-EQEC 2015, 21-06-2015 - 25-06-2015, Munich, Germany (pp. CH_P_35 -).

Bayraktar, M. and Chopra, A. and Rijnders, A.J.H.M. and Boller, K-J. and Bijkerk, F. (2016) Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts. In: SPIE Advanced Lithography Conference, 22-02-2015, San Jose, California.

Boogaard, A.J.R. van den and Louis, E. and Goldberg, K.A. and Mochi, I. and Bijkerk, F. (2010) EUV-multilayers on grating-like topographies. In: Extreme Ultraviolet (EUV) Lithography, 22–25 February 2010, San Jose, CA, USA (pp. 76362S).

Coloma Ribera, R. and Kruijs, R.W.E. van de and Sturm, J.M. and Yakshin, A.E. and Bijkerk, F. (2014) Surface and sub-surface oxidation of thin films using Low Energy Ion Scattering. In: LEIS Workshop 2014, 22-05-2014 - 22-05-2014, Enschede.

Gao, A. and Scaccabarozzi, L. and Diago, P. Rizo and Lee, C.J. and Banine, V. and Bijkerk, F. (2012) Photoluminescence-based detection of particle coontamination on EUV reticle. In: SPIE Optical Engineering & Applications, 12-08-2012 - 16-08-2012, San Diego.

Gao, A. and Scaccabarozzi, L. and Rizo Diago, P. and Lee, C.J. and Banine, V.Y. and Bijkerk, F. (2012) Photoluminescence-based detection of particle coontamination on EUV reticle. In: Advances in Metrology for X-Ray and EUV Optics IV, 12-08-2012 - 16-08-2012, San Diego (pp. 8501-13 - ).

Huang, Q. and Boogaard, A.J.R. van den and Kruijs, R.W.E. van de and Zoethout, E. and Medvedev, V.V. and Louis, E. and Bijkerk, F. (2013) Suppression of long wavelength reflection from extreme-UV multilayer optics. In: SPIE Advances in X-Ray/EUV Optics and Components VIII, 88480N, 25-08-2013, San Diego, California (pp. 5 -).

Huber, S.P. and Kruijs, R.W.E. van de and Yakshin, A. and Zoethout, E. and Bijkerk, F. (2013) Engineering optical constants for broadband single layer antireflection coatings. In: SPIE Advances in X-Ray/EUV Optics and Components VIII, 27-09-2013, San Diego (pp. 884814-1 - 884814-4).

Makhotkin, I.A. and Kruijs, R.W.E. van de and Zoethout, E. and Louis, E. and Bijkerk, F. (2013) Optimization of LaN/B multilayer mirrors for 6.x nm wavelength. In: Advances in X-Ray/EUV Optics and Components VIII, 25-08-2013 (pp. 1 - 5).

Makhotkin, I.A. and Zoethout, E. and Louis, E. and Yakunin, A.M. and Muellender, S. and Bijkerk, F. (2012) Wavelength selection for multilayer coatings for the lithography generation beyond EUVL. In: Extreme Ultraviolet (EUV) Lithography III (San Jose, California, USA), Amsterdam.

Makhotkin, I.A. and Zoethout, E. and Louis, E. and Yakunin, S.N. and Muellender, S. and Bijkerk, F. (2012) Wavelength selection for multilayer coatings for the lithography generation beyond EUVL. In: Extreme Ultraviolet (EUV) Lithography III, 13-03-2012, San Jose, CA, US (pp. 832213-1 - 832213-5).

Medvedev, V.V. and Yakshin, A. and Kruijs, R.W.E. van de and Krivtsun, V.M. and Louis, E. and Bijkerk, F. (2013) EUV optical elements with enhanced spectral selectivity for IR radiation. In: 2013 International Workshop in EUV and Soft X-ray Sources, Dublin, Ireland.

Meer, R. van der and Krishnan, B. and Kozhevnikov, I.V. and Boer, M.J. de and Vratzov, B. and Bastiaens, H.M.J. and Huskens, J. and Wiel, W.G. van der and Hegeman, P.E. and Brons, G.C.S. and Boller, K.-J. and Bijkerk, F. (2011) Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings. In: Advances in X-ray/EUV Optics and Components VI, 22 August 2011 , San Diego, CA, USA (pp. 81390Q-1-81390Q-8).

Patent

Bijkerk, Frederik and Wiel, Wilfred Gerard van der and Meer, Robert van der and Hegeman, Petra E. (2011) Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelenght range, and BF and LMAG structures manufactured according to this method. Patent.

Dinger, U. and Bijkerk, F. and Bayraktar, M. and Dier, O. (2012) EUV mirror arrangement, optical system comprising EUV mirror arrangement and method for operating an optical system comprising an EUV mirror arrangement. Patent.

Goor, F.A. van and Bijkerk, F. and Boogaard, A.J.R. van den and Meer, R. van der (2012) Spectral filter for splitting a beam with electromagnetic radiation having wavelengths in the extreme ultraviolet (EUV) or soft X-Ray (Soft X) and the infrared (IR) wavelength range. Patent.

Kruijs, R.W.E. van de and Nyabero, S.L. and Yakshin, A. and Bijkerk, F. (2014) Optical element comprising a multilayer coating, and optical arrangement comprising same. Patent.

Medvedev, V.V. and Yakshin, A. and Bijkerk, F. (2016) Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage. Patent.

Medvedev, V.V. and Yakshin, A. and Krivtsun, V.M. and Bijkerk, F. (2016) Kombinierter Reflektor und Filter für Licht underschiedlicher Wellenlängen. Patent.

This list was generated on Thu Sep 29 05:22:31 2016 CEST.