Author Publications

2013

Meer van der, R. and Kozhevnikov, I.V. and Krishnan, B. and Huskens, J. and Hegeman, P.E. and Brons, G.C.S. and Vratzov, B. and Bastiaens, H.M.J. and Boller, K.J. and Bijkerk, F. (2013) Single-order operation of lamellar multilayer gratings in the soft x-ray spectral range. AIP advances, 3 (1). 012103. ISSN 2158-3226

2012

Bayraktar, M. and Wessels, W.A. and Lee, C.J. and Goor van, F.A. and Koster, G. and Rijnders, G. and Bijkerk, F. (2012) Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths. Journal of physics D: applied physics, 45 (49). 494001-1 - 494001-5. ISSN 0022-3727

Boogaard van den, A.J.R. and Goor van, F.A. and Louis, E. and Bijkerk, F. (2012) Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection. Optics letters, 37 (2). 160 - 162. ISSN 0146-9592

Bosgra, J. and Verhoeven, J. and Kruijs van de, R.W.E. and Yakshin, A.E. and Bijkerk, F. (2012) Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth. Thin solid films, 522 . 228 - 232. ISSN 0040-6090

Bosgra, J. and Zoethout, E. and Eerden, A.M.J. and Verhoeven, J. and Kruijs van de, R.W.E. and Yakshin, A.E. and Bijkerk, F. (2012) Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors. Applied optics, 51 (36). 8541 - 8548. ISSN 0003-6935

Bruijn, S. and Kruijs van de, R.W.E. and Yakshin, A.E. and Bijkerk, F. (2012) Ion assisted growth of B 4C diffusion barrier layers in Mo/Si multilayered structures. Journal of applied physics, 111 (6). 64303 - 64307. ISSN 0021-8979

Dinger, U. and Bijkerk, F. and Bayraktar, M. and Dier, O. (2012) EUV mirror arrangement, optical system comprising EUV mirror arrangement and method for operating an optical system comprising an EUV mirror arrangement. Patent.

Gao, A. and Scaccabarozzi, L. and Rizo Diago, P. and Lee, C.J. and Banine, V.Y. and Bijkerk, F. (2012) Photoluminescence-based detection of particle coontamination on EUV reticle. In: SPIE Optical Engineering & Applications 8501-13.

Goor van, F.A. and Bijkerk, F. and Boogaard van den, A.J.R. and Meer van der, R. (2012) Spectral filter for splitting a beam with electromagnetic radiation having wavelengths in the extreme ultraviolet (EUV) or soft X-Ray (Soft X) and the infrared (IR) wavelength range. Patent.

Kuznetsov, A.S. and Gleeson, M.A. and Bijkerk, F. (2012) Hydrogen-induced blistering mechanisms in thin film coatings. Journal of physics. Condensed matter, 24 (5). ISSN 0953-8984

Kuznetsov, A.S. and Stuik, R. and Bijkerk, F. and Shevelko, A.P. (2012) Spectral and spatial structure of extreme ultraviolet radiation in laser plasma-wall interactions. Plasma physics and controlled fusion, 54 (8). 1 - 6. ISSN 0741-3335

Liu, F. and Lee, C.J. and Chen, J. and Louis, E. and Slot van der, P.J.M. and Boller, K.J. and Bijkerk, F. (2012) Ellipsometry with randomly varying polarization states. Optics express, 20 (2). 870 - 878. ISSN 1094-4087

Loch, R.A. and Sobierajski, R. and Louis, E. and Bijkerk, F. (2012) Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources. Optics express, 20 (27). 28200 - 28215. ISSN 1094-4087

Makhotkin, I.A. and Zoethout, E. and Louis, E. and Yakunin, A.M. and Muellender, S. and Bijkerk, F. (2012) Spectral properties of La/B - Based multilayer mirrors near the boron K absorption edge. Optics express, 20 (11). 11778 - 11786. ISSN 1094-4087

Makhotkin, I.A. and Zoethout, E. and Louis, E. and Yakunin, A.M. and Muellender, S. and Bijkerk, F. (2012) Wavelength selection for multilayer coatings for the lithography generation beyond EUVL. In: Extreme Ultraviolet (EUV) Lithography III (San Jose, California, USA), Amsterdam.

Makhotkin, I.A. and Zoethout, E. and Louis, E. and Yakunin, A.M. and Muellender, S. and Bijkerk, F. (2012) Wavelength selection for multilayer coatings for the lithography generation beyond EUVL. Journal of micro/nanolithography, MEMS, and MOEMS, 11 (4). 040501-1 - 040501-3. ISSN 1932-5150

Medvedev, V.V. and Yakshin, A.E. and Kruijs van de, R.W.E. and Krivtsun, V.M. and Yakunin, A.M. and Koshelev, K.N. and Bijkerk, F. (2012) Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors. Optics letters, 37 (7). 1169 - 1171. ISSN 0146-9592

Nyabero, S.L. and Kruijs van de, R.W.E. and Yakshin, A.E. and Zoethout, E. and Bijkerk, F. (2012) Thermally induced interface chemistry in Mo/B 4C/Si/B 4C multilayered films. Journal of applied physics, 112 (5). 054317-1 - 054317-5. ISSN 0021-8979

2011

Bijkerk, Frederik and Wiel van der, Wilfred Gerard and Meer van der, Robert and Hegeman, Petra E. (2011) Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelenght range, and BF and LMAG structures manufactured according to this method. Patent.

Chen, Juequan and Louis, Eric and Wormeester, Herbert and Harmsen, Rob and Kruijs van de, Robbert and Lee, Chris J. and Schaik van, Willem and Bijkerk, Fred (2011) Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science and Technology, 22 (10). p. 105705. ISSN 0957-0233

Kozhevnikov, I.V. and Meer van der, R. and Bastiaens, H.M.J. and Boller, K.-J. and Bijkerk, F. (2011) Analytic theory of soft x-ray diffraction by lamellar multilayer gratings. Optics Express, 19 (10). pp. 9172-9184. ISSN 1094-4087

Meer van der, R. and Krishnan, B. and Kozhevnikov, I.V. and Boer de, M.J. and Vratzov, B. and Bastiaens, H.M.J. and Huskens, J. and Wiel van der, W.G. and Hegeman, P.E. and Brons, G.C.S. and Boller, K.-J. and Bijkerk, F. (2011) Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings. In: Advances in X-ray/EUV Optics and Components VI, 22 August 2011 , San Diego, CA, USA.

2010

Boogaard van den, A.J.R. and Louis, E. and Goldberg, K.A. and Mochi, I. and Bijkerk, F. (2010) EUV-multilayers on grating-like topographies. In: Extreme Ultraviolet (EUV) Lithography. Proceedings of SPIE, 7636 . SPIE--The International Society for Optical Engineering, 76362S. ISBN 9780819480507

Boogaard van den, A.J.R. and Louis, E. and Zoethout, E. and Mullender, S. and Bijkerk, F. (2010) Surface morphology of Kr+-polished amorphous Si layers. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 28 (4). p. 552. ISSN 0734-2101

Bruijn, S. and Kruijs van de, R.W.E. and Yakshin, A.E. and Zoethout, E. and Bijkerk, F. (2010) Thermally induced decomposition of B4C barrier layers in Mo/Si multilayer structures. Surface and Coatings Technology, 205 (7). pp. 2469-2473. ISSN 0257-8972

Chen, Juequan and Louis, Eric and Verhoeven, Jan and Harmsen, Rob and Lee, Chris J. and Lubomska, Monika and Kampen van, Maarten and Schaik van, Willem and Bijkerk, Fred (2010) Secondary electron yield measurements of carbon covered multilayer optics. Applied Surface Science, 257 (2). pp. 354-361. ISSN 0169-4332

Dobrovolskiy, S. and Yakshin, A.E. and Tichelaar, F.D. and Verhoeven, J. and Louis, E. and Bijkerk, F. (2010) Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing. Nuclear Instruments and Methods in Physics Research. Section B: Beam interactions with materials and atoms, 268 (6). pp. 560-567. ISSN 0168-583X

Khorsand, A.R. and Sobierajski, R. and Louis, E. and ........, .... and Gleeson, A. and Gullikson, E.M. and Bijkerk, F. (2010) Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure. Optics Express, 18 (2). p. 700. ISSN 1094-4087

Kozhevnikov, I.V. and Meer van der, R. and Bastiaens, H.M.J. and Boller, K.-J. and Bijkerk, F. (2010) High-resolution, high-reflectivity operation of lamellar multilayer amplitude gratings: identification of the single-order regime. Optics Express, 18 (15). pp. 16234-16242. ISSN 1094-4087

Kuznetsov, A.S. and Kruijs van de, R.W.E. and Gleeson, M.A. and Schmid, K. and Bijkerk, F. (2010) Hydrogen interaction with EUVL-relevant optical materials. Journal of Surface Investigation. X-ay, Synchrotron and Neutron Techniques, 4 (4). pp. 563-566. ISSN 1027-4510

Louis, E. and Hattum van, E.D. and Westen van der, S. Alonso and Salle, P. and Grootkarzijn, K.T. and Zoethout, E. and Bijkerk, F. and Blanckenhagen von, G. and Mullender, S. (2010) High reflectance multilayers for EUVL HVM-projection optics. In: Extreme Ultraviolet (EUV) Lithography. Proceedings of SPIE, 7636 . SPIE--The International Society for Optical Engineering, 76362T. ISBN 9780819480507

Rooij-Lohmann de, V.I.T.A. and Kozhevnikov, I.V. and Peverini, L. and Ziegler, E. and Cuerno, R. and Bijkerk, F. and Yakshin, A.E. (2010) Roughness evolution of Si surfaces upon Ar ion erosion. Applied Surface Science, 256 (16). pp. 5011-5014. ISSN 0169-4332

Rooij-Lohmann de, V.I.T.A. and Yakshin, A.E. and Kruijs van de, R.W.E. and Zoethout, E. and Kleyn, A.W. and Keim, E.G. and Gorgoi, M. and Schäfers, F. and Brongersma, H.H. and Bijkerk, F. (2010) Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems. Journal of Applied Physics, 108 (1). 014314. ISSN 0021-8979

Tsarfati, T. and Kruijs van de, R.W.E. and Zoethout, E. and Bijkerk, F. (2010) Nitridation and contrast of B4C/La interfaces and X-ray multilayer optics. Thin Solid Films, 518 (24). pp. 7249-7252. ISSN 0040-6090

Yakshin, A.E. and Kozhevnikov, I.V. and Zoethout, E. and Louis, E. and Bijkerk, F. (2010) Properties of broadband depth-graded multilayer mirrors for EUV optical systems. Optics Express, 18 (7). pp. 6957-6971. ISSN 1094-4087

2009

Boogaard van den, A.J.R. and Louis, E. and Goor van, F.A. and Bijkerk, Fred (2009) Optical element for full spectral purity from IR-generated EUV light sources. In: Alternative Lithographic Technologies. Proceedings of SPIE, 7271 . SPIE, 72713B. ISBN 9780819475244

Gou, F. and Gleeson, M.A. and Kleyn, A.W. and Kruijs van de, R.W.E. and Yakshin, A.E. and Bijkerk, F. (2009) Growth of silicon nitride films by bombarding amorphous silicon with N+ ions: MD simulation. Nuclear Instruments and Methods in Physics Research. Section B: Beam interactions with materials and atoms, 267 (18). pp. 3245-3248. ISSN 0168-583X

Loch, R.A. and Levy, A. and Ceccotti, T. and Quere, F. and Thaury, C. and George, H. and Bijkerk, F. and Boller, K.-J. and Martin, Ph. (2009) Enhanced ion acceleration with extremely thin foils. European physical journal. Special topics, 175 (1). pp. 133-138. ISSN 1951-6355

Rooij-Lohmann de, V.I.T.A. and Kleyn, A.W. and Bijkerk, F. and Brongersma, H.H. and Yakshin, A.E. (2009) Diffusion and interaction studied nondestructively and in real-time with depth-resolved low energy ion spectroscopy. Applied Physics Letters, 94 (063107). 063107. ISSN 0003-6951

Tsarfati, Tim and Zoethout, Erwin and Kruijs van de, Robbert and Bijkerk, F. (2009) Chemically mediated diffusion of d-metals and B through Si and agglomeration at Si-on-Mo interfaces. Journal of applied physics, 105 (104305). p. 104305. ISSN 0021-8979

Tsarfati, T. and Kruijs van de, R.W.E. and Zoethout, E. and Louis, E. and Bijkerk, F. (2009) Reflective multilayer optics for 6.7 nm wavelength radiation sources and next generation lithography. Thin Solid Films, 518 (5). pp. 1365-1368. ISSN 0040-6090

Tsarfati, T. and Zoethout, E. and Kruijs van de, R.W.E. and Bijkerk, F. (2009) Atomic O and H exposure of C-covered and oxidized d-metal surfaces. Surface Science, 603 (16). pp. 2594-2599. ISSN 0039-6028

Tsarfati, Tim and Zoethout, Erwin and Kruijs van de, Robbert and Bijkerk, Fred (2009) Growth and sacrificial oxidation of transition metal nanolayers. Surface Science Letters, 603 (7). pp. 1041-1045. ISSN 0167-2584

Tsarfati, Tim and Zoethout, Erwin and Kruijs van de, Robbert and Bijkerk, Fred (2009) In-depth agglomeration of d-metals at Si-on-Mo interfaces. Journal of Applied Physics, 105 (06). 064314. ISSN 0021-8979

Tsarfati, Tim and Zoethout, Erwin and Louis, Eric and Kruijs van de, Robbert and Yakshin, Andrey and Müllender, Stephan and Bijkerk, Fred (2009) Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the extreme UV. In: Alternative Lithographic Technologies. Proceedings of SPIE, 7271 . SPIE, 72713V. ISBN 9780819475244

Wu, Shiou-Min and Kruijs van de, Robbert and Zoethout, Erwin and Bijkerk, Fred (2009) Sputtering yields of Ru, Mo, and Si under low energy Ar+ bombardment. Journal of applied physics, 106 (054902). 054902. ISSN 00218979