Author Publications

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Jump to: 2005 | 2004 | 2003 | 2002 | 2001
Number of items: 15.

2005

Wang, Z. and Ackaert, J. and Scarpa, A. and Salm, C. and Kuper, F.G. and Vugts, M. (2005) Strategies to Cope with Plasma Charging Damage in Design and Layout Phases. In: International Conference on Integrated Circuit Design and Technology, ICICDT, 9-11 May 2005, Austin, Texas, USA (pp. pp. 91-98).

2004

Wang, Z. and Ackaert, J. and Salm, C. and Kuper, F.G. and De Backer, E. (2004) Plasma charging damage reduction in IC processing by a self-balancing interconnect. Microelectronics Reliability, 44 (9-11). pp. 1503-1507. ISSN 0026-2714

Wang, Zhichun (2004) Detection of and protection against plasma charging damage in modern ic technology. thesis.

Wang, Zhichun and Ackaert, Jan and Salm, Cora and Kuper, Fred G. and Tack, Marnix and De Backer, Eddy and Coppens, Peter and De Schepper, Luc and Vlachakis, Basil (2004) Plasma-Charging Damage of Floating MIM Capacitors. IEEE Transactions on Electron Devices, 51 (6). pp. 1017-1024. ISSN 0018-9383

2003

Wang, Zhichun and Ackaert, Jan and Salm, Cora and Kuper, Fred G. and Bessemans, Klara and Backer, Eddy de (2003) Plasma charging damage induced by a power ramp down step in the end of plasma enhanced chemical vapour deposition (PECVD) process. In: 6th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2003, 25-26 November 2003, Veldhoven, The Netherlands (pp. pp. 766-770).

2002

Ackaert, Jan and Wang, Zhichun and Backer, Eddy de and Salm, Cora (2002) Correlation between hot carrier stress, oxide breakdown and gate leakage current for monitoring plasma processing induced damage on gate oxide. In: 7th International Symposium of Plasma Process-Induced Damage, June 6-7, 2002, Maui, Hawaii, USA (pp. 45- 48).

Ackaert, Jan and Wang, Zhichun and De Backer, E. and Coppens, P. (2002) Charging damage in floating metal-insulator-metal capacitors. In: 6th International Symposium on Plasma Process-Induced Damage, 13-15 May 2001, Monterey, California, USA (pp. pp. 120-123).

Ackaert, Jan and Wang, Zhichun and De Backer, E. and Coppens, P. (2002) Plasma damage in floating metal-insulator-metal capacitors. In: 8th International Symposium on the Physical & Failure Analysis of Integrated Circuits, 9-13 July 2001, Singapore, Thailand (pp. pp. 224-227).

Wang, Z. and Scarpa, A. and Smits, S.M. and Kuper, F.G. and Salm, C. (2002) Temperature effect on protection diode for plasma-process induced charging damage. In: Proceedings of the 5th annual workshop on Semiconductors Advances for Future Electronics SAFE 2002, 27-28 November 2002, Veldhoven, The Netherlands (pp. pp. 127-130).

Wang, Zhichun and Ackaert, Jan and Salm, Cora and Backer, Eddy de and Bosch, Geert van den and Zawalski, Wade (2002) Correlation between Hot Carrier Stress, Oxide Breakdown and Gate Leakage Current for Monitoring Plasma Processing Induced Damage on Gate Oxide. In: 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits, 2002. IPFA, Singapore, Thailand, 8-12 July 2002, Singapore, Thailand (pp. pp. 242-245).

Wang, Zhichun and Scarpa, Andrea and Smits, Sander and Salm, Cora and Kuper, Fred (2002) Temperature Effect on Antenna Protection Strategy for Plasma-Process Induced Charging Damage. In: 7th International Symposium of Plasma Process-Induced Damage, June 6-7, 2002, Maui, Hawaii, USA (pp. pp. 134-137).

2001

Ackaert, J. and Wang, Z. and De Backer, E. and Colson, P. and Coppens, P. (2001) Non contact surface potential measurements for charging reduction during manufacturing of metal-insulator-metal capacitors. Microelectronics Reliability, 41 (9-10). pp. 1403-1407. ISSN 0026-2714

Wang, Zhichun and Ackaert, Jan and Salm, Cora and Kuper, Fred (2001) Plasma process-induced latent damage on gate oxide-demonstrated by single-layer and multi-layer antenna structures. In: 8th International Symposium on the Physical & Failure Analysis of Integrated Circuits, IPFA, July 9-13, 2001, Singapore, Thailand (pp. pp. 220-223).

Wang, Zhichun and Ackaert, Jan and Salm, Cora and Kuper, Fred (2001) Charging induced damage on complex-antenna test structures. In: Proceedings of the 4th annual workshop on Semiconductor Advances for Future Electronics and Sensors SAFE 2001, 29-30 Nov 2001, Veldhoven, The Netherlands (pp. pp. 220-223).

Wang, Zhichun and Scarpa, Andrea and Salm, Cora and Kuper, Fred (2001) Relation between Plasma Process-Induced Oxide Failure Fraction and Antenna Ratio. In: 6th International Symposium on Plasma Process-Induced Damage, May 14-15, 2001, Monterey, CA, USA (pp. pp. 16-19).

This list was generated on Wed Aug 27 05:28:40 2014 CEST.