Author Publications

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Number of items: 20.

2002

Veenendaal, E. van and Nijdam, A.J. and Suchtelen, J. van (2002) Simulation of crystal shape evolution in two dimensions. Journal of Crystal Growth, 235 (1-4). pp. 603-618. ISSN 0022-0248

2001

Nijdam, A.J. and Gardeniers, J.G.E. and Berenschot, J.W. and Veenendaal, E. van and Suchtelen, J. van and Elwenspoek, M. (2001) Influence of the angle between etched (near) Si{111} surfaces and the substrate orientation on the underetch rate during anisotropic wet-chemical etching of silicon. Journal of Micromechanics and Microengineering, 11 (5). pp. 499-503. ISSN 0960-1317

Nijdam, A.J. and Veenendaal, E. van and Cuppen, H.M. and Suchtelen, J. van and Reed, M.L. and Gardeniers, J.G.E. and Enckevort, W.J.P. van and Vlieg, E. and Elwenspoek, M. (2001) Formation and stabilization of pyramidal etch hillocks on silicon {100} in anisotropic etchants: experiments and Monte Carlo simulation. Journal of Applied Physics, 89 (7). pp. 4113-4116. ISSN 0021-8979

Nijdam, Arend Jasper (2001) Anisotropic wet-chemical etching of silicon pits, peaks, principles, pyramids and particles. thesis.

Veenendaal, E. van and Cuppen, H.M. and Enckevort, W.J.P. van and Suchtelen, J. van and Nijdam, A.J. and Elwenspoek, M. and Vlieg, E. (2001) A monte carlo study of etching in the presence of a mask junction. Journal of Micromechanics and Microengineering, 11 (4). pp. 409-415. ISSN 0960-1317

Veenendaal, E. van and Sato, K. and Shikida, M. and Nijdam, A.J. and Suchtelen, J. van (2001) Micro-morphology of single crystalline silicon surfaces during anisotropic wet chemical etching in KOH: velocity source forests. Sensors and Actuators A: Physical, 93 (3). pp. 232-242. ISSN 0924-4247

Veenendaal, Erik van and Suchtelen, Jaap van and Beurden, Paul van and Cuppen, Herma M. and Enckevort, Willem J.P. van and Nijdam, A. Jasper and Elwenspoek, Miko and Vlieg, Elias (2001) Monte carlo simulation of wet chemical etching of silicon. Sensors and Materials, 13 (6). pp. 343-350. ISSN 0914-4935

2000

Nijdam, A.J. and Veenendaal, E. van and Cuppen, H. and Suchtelen, J. van and Reed, M.L. and Gardeniers, J.G.E. and Enckevort, W.J.P. van and Vlieg, E. and Elwenspoek, M.C. (2000) Formation and stabilization of pyramidal etch hillocks on silicon {100} in anisotropic etchants: experiments and Monte Carlo simulation. In: MicroMechanics Europe (MME) 2000, October 1-3, 2000, Uppsala, Sweden .

Nijdam, A.J. and Gardeniers, J.G.E. and Gui, C. and Elwenspoek, M. (2000) Etching pits and dislocations in Si{111}. Sensors and Actuators A: Physical, 86 (3). pp. 238-247. ISSN 0924-4247

Nijdam, A.J. and Veenendaal, E. van and Gardeniers, J.G.E. and Kentgens, A.P.M. and Nachtegaal, G.H. and Elwenspoek, M. (2000) 29 Si-Nuclear magnetic resonance on the etching products of silicon in potassium hydroxide solutions. Journal of the Electrochemical Society, 147 (6). pp. 2195-2198. ISSN 0013-4651

Oosterbroek, R.E. and Berenschot, J.W. and Jansen, H.V. and Nijdam, A.J. and Pandraud, G. and Berg, A. van den and Elwenspoek, M.C. (2000) Etching methodologies in <111>-oriented silicon wafers. Journal of Microelectromechanical Systems, 9 (3). pp. 390-396. ISSN 1057-7157

Veenendaal, E. van and Nijdam, A.J. and Suchtelen, J. van and Sato, K. and Gardeniers, J.G.E. and Enckevort, W.J.P. van and Elwenspoek, M. (2000) Simulation of anisotropic wet chemical etching using a physical model. Sensors and Actuators A: Physical, 84 (3). pp. 324-329. ISSN 0924-4247

Veenendaal, E. van and Suchtelen, J. van and Enckevort, W.J.P. van and Sato, K. and Nijdam, A.J. and Gardeniers, J.G.E. and Elwenspoek, M. (2000) The construction of orientation-dependent crystal growth and etch rate functions II: Application to wet chemical etching of silicon in potassium hydroxide. Journal of Applied Physics, 87 (12). pp. 8732-8740. ISSN 0021-8979

Veenendaal, E. van and Cuppen, H. and Enckevort, W.J.P. van and Suchtelen, J. van and Nijdam, A.J. and Elwenspoek, M.C. and Vlieg, E. (2000) A Monte Carlo study of etching in the presence of a mask junction. In: MicroMechanics Europe (MME) 2000, October 1-3, 2000, Uppsala, Sweden .

1999

Nijdam, A.J. and Berenschot, J.W. and Suchtelen, J. van and Gardeniers, J.G.E. and Elwenspoek, M. (1999) Velocity sources as an explanation for experimentally observed variations in Si{111} etch rates. Journal of Micromechanics and Microengineering, 9 (2). pp. 135-138. ISSN 0960-1317

Nijdam, A.J. and Suchtelen, J. van and Berenschot, J.W. and Gardeniers, J.G.E. and Elwenspoek, M.C. (1999) Etching of silicon in alkaline solutions: a critical look at the {111} minimum. Journal of Crystal Growth, 198-19 (Part 1). pp. 430-434. ISSN 0022-0248

Oosterbroek, R.E. and Berenschot, J.W. and Nijdam, A.J. and Pandraud, G. and Elwenspoek, M.C. and Berg, A. van den (1999) New design methodologies in <111>-oriented silicon wafers. In: Micromachining and Microfabrication 1999, 20 September 1999, Santa Clara, CA, USA (pp. pp. 384-394).

Suchtelen, J. van and Nijdam, A.J. and Veenendaal, E. van (1999) The velocity source concept. Journal of Crystal Growth, 198-19 (Part 1). pp. 17-21. ISSN 0022-0248

Suchtelen, J. van and Sato, K. and Veenendaal, E. van and Nijdam, A.J. and Gardeniers, J.G.E. and Enckevort, W.J.P. van and Elwenspoek, M. (1999) Simulation of anisotropic wet-chemical etching using a physical model. In: Twelfth IEEE International Conference on Micro Electro Mechanical Systems, MEMS , January 17-21, 1999, Orlando, Florida, USA (pp. pp. 332-337).

1998

Nijdam, A.J. and Berenschot, J.W. and Suchtelen, J. van and Gardeniers, J.G.E. and Elwenspoek, M.C. (1998) Velocity sources as an explanation for experimentally observed variations in Si{111} etch rates. In: Micromechanics Europe Conference, MME, June 3–5, 1998, Ulvik, Norway (pp. pp. 74-77).

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