Author Publications

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Jump to: 1999 | 1998 | 1997
Number of items: 6.


Schoenmaker, Wim and Petrescu, Violeta (1999) Modeling electromigration as a fluid–gas system. Microelectronics Reliability, 39 (11). pp. 1667-1676. ISSN 0026-2714


Mouthaan, Ton J. and Petrescu, Violeta (1998) The modeling of resistance changes in the early phase of electromigration. Microelectronics Reliability, 38 (1). pp. 99-105. ISSN 0026-2714

Petrescu, V. and Mouthaan, A.J. and Schoenmaker, W. and Salm, C. (1998) Mechanical stress evolution and the blech length: 2D simulation of early electromigration effects. Microelectronics Reliability, 38 (6-8). pp. 1047-1050. ISSN 0026-2714


Petrescu, V. and Mouthaan, A.J. (1997) 2D Modelling of Mechanical Stress Evolution and Electromigration in Confined Aluminium Interconnects. In: 21st International Conference on Microelectronics, MIEL 1997, NIS, Yugoslavia, 14-17 September 1997, Nis, Serbia (pp. pp. 629-632).

Petrescu, V. and Mouthaan, A.J. and Dima, G. and Govoreanu, B. and Mitrea, O. and Profirescu, M. (1997) Early resistance change and stress/electromigration evolution in near bamboo interconnects. In: International Semiconductor Conference, CAS, 7-11 Oct. 1997, Sinaia Romania (pp. pp. 311-314).

Petrescu, V. and Mouthaan, A.J. and Schoenmaker, W. (1997) Early resistance change and stress/electromigrationmodeling in aluminium interconnects. Microelectronics Reliability, 37 (10-11). pp. 1491-1494. ISSN 0026-2714

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