Schoenmaker, Wim and Petrescu, Violeta (1999) Modeling electromigration as a fluid–gas system. Microelectronics Reliability, 39 (11). pp. 1667-1676. ISSN 0026-2714
Mouthaan, Ton J. and Petrescu, Violeta (1998) The modeling of resistance changes in the early phase of electromigration. Microelectronics Reliability, 38 (1). pp. 99-105. ISSN 0026-2714
Petrescu, V. and Mouthaan, A.J. and Schoenmaker, W. and Salm, C. (1998) Mechanical stress evolution and the blech length: 2D simulation of early electromigration effects. Microelectronics Reliability, 38 (6-8). pp. 1047-1050. ISSN 0026-2714
Borgarino, M. and Petrescu, V. and Brizzolara, L. and Munari, I. de and Fantini, F. (1997) Electrical and thermal simulation of local effects for electromigration. Semiconductor science and technology, 12 (11). pp. 1369-1377. ISSN 0268-1242
Petrescu, V. and Mouthaan, A.J. (1997) 2D Modelling of Mechanical Stress Evolution and Electromigration in Confined Aluminium Interconnects. In: 21st International Conference on Microelectronics, MIEL 1997, NIS, Yugoslavia, 14-17 September 1997, Nis, Serbia (pp. pp. 629-632).
Petrescu, V. and Mouthaan, A.J. and Dima, G. and Govoreanu, B. and Mitrea, O. and Profirescu, M. (1997) Early resistance change and stress/electromigration evolution in near bamboo interconnects. In: International Semiconductor Conference, CAS, 7-11 Oct. 1997, Sinaia Romania (pp. pp. 311-314).
Petrescu, V. and Mouthaan, A.J. and Schoenmaker, W. (1997) Early resistance change and stress/electromigrationmodeling in aluminium interconnects. Microelectronics Reliability, 37 (10-11). pp. 1491-1494. ISSN 0026-2714
Klootwijk, J.H. and Kranenburg, H. van and Cobianu, C. and Petrescu, V. and Woerlee, P.H. and Wallinga, H. (1995) An intensive study of LPCVD silicon morphology and texture for non volatile memory. In: 25th European Solid State Device Research Conference, ESSDERC '95, 25-27 September 1995, The Hague, the Netherlands (pp. pp. 383-386).
Petrescu, V. and Mouthaan, T. and Schoenmaker, W. and Angelescu, S. and Vissarion, R. and Dima, G. and Wallinga, H. and Profirescu, M.D. (1995) Numerical analysis of electromigration in thin film VLSI interconnections. In: International Semiconductor Conference, CAS '95, 11-14 October 1995, Sinaia, Romania (pp. pp. 327-330).