Author Publications

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Number of items: 16.

2011

Roy, Deepu and Klootwijk, Johan H. and Gravesteijn, Dirk J. and Wolters, Rob A.M. (2011) Contact resistance of TiW to ultra-thin phase change material layers. In: 41st European Solid-State Device Research Conference, ESSDERC 2011, 12-16 September 2011, Helsinki, Finland (pp. pp. 87-90).

2009

Roy, D. and Klootwijk, J.H. and Verhaegh, N.A.M. and Roosen, H.H.A.J. and Wolters, R.A.M. (2009) Comb Capacitor Structures for On-Chip Physical Uncloneable Function. IEEE Transactions on Semiconductor Manufacturing, 22 (1). pp. 96-102. ISSN 0894-6507

Roy, D. and Zandt, M.A.A. in 't and Wolters, R.A.M. and Timmering, C.E. and Klootwijk, J.H. (2009) Contact resistance of TiW to phase change material in the amorphous and crystalline states. In: 10th Non-Volatile Memory Technology Symposium, NVMTS 2009, 25-28 October 2009, Portland, OR, USA (pp. pp. 12-15).

Stavitski, N. and Klootwijk, J.H. and van Zeijl, H.W. and Kovalgin, A.Y. and Wolters, R.A.M. (2009) Cross-Bridge Kelvin resistor structures for reliable measurement of low contact resistances and contact interface characterization. IEEE Transactions on Semiconductor Manufacturing, 22 (1). pp. 146-152. ISSN 0894-6507

2008

Jinesh, K.B. and Lamy, Y. and Wolters, R.A.M. and Klootwijk, J.H. and Tois, E. and Roozeboom, F. and Besling, W.F.A. (2008) Silicon out-diffusion and aluminum in-diffusion in devices with atomic-layer deposited La2O3 thin films. Applied physics letters, 93 (19). p. 192912. ISSN 0003-6951

Roy, D. and In 't Zand, M.A.A. and Delhounge, R. and Klootwijk, J.H. and Wolters, R.A.M. (2008) Influence of interfacial layer on contact resistance. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands (pp. pp. 499-500).

Roy, D. and Klootwijk, J.H. and Verhaegh, N.A.M. and Roosen, H.H.A.J. and Wolters, R.A.M. (2008) Comb capacitor structures for measurement of post-processed layers. In: Proceedings of the 21st ICMTS 2008 IEEE Conference on Microelectronic Test Structures, 24-28 Mar 2008, Edinburgh, Schotland (pp. pp. 205-209).

Stavitski, N. and Klootwijk, J.H. and van Zeijl, H.W. and Kovalgin, A.Y. and Wolters, R.A.M. (2008) A study of cross-bridge kelvin resistor structures for reliable measurement of low contact resistances. In: Proceedings of the 21st ICMTS 2008 IEEE Conference on Microelectronic Test Structures, 24-28 Mar 2008, Edinburgh, Schotland (pp. pp. 199-204).

2007

Stavitski, N. and Klootwijk, J.H. and van Zeijl, H.W. and Boksteen, B.K. and Kovalgin, A.Y. and Wolters, R.A.M. (2007) Cross-bidge Kelvin resistor (CBKR) structures for measurement of low contact resistances. In: 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), 29-30 Nov 2007, Veldhoven, The Netherlands (pp. pp. 551-554).

2006

Stavitski, N. and Dal, M.J.H. van and Klootwijk, J.H. and Wolters, R.A.M. and Kovalgin, A.Y. and Schmitz, J. (2006) Cross-Bridge Kelvin Resistor (CBKR) structures for silicide-semiconductor junctions characterization. In: Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006, 23-24 Nov 2006, Veldhoven, The Netherlands (pp. pp. 436-438).

1999

Klootwijk, Johan H. and Kranenburg, Herma van and Woerlee, Pierre H. and Wallinga, Hans (1999) Deposited Inter-Polysilicon Dielectrics for Nonvolatile Memories. IEEE Transactions on Electron Devices, 1999 (7). pp. 1435-1445. ISSN 0018-9383

1998

Klootwijk, J.H. and Kranenburg, H. van and Weusthof, M.H.H. and Woerlee, P.H. and Wallinga, H. (1998) RTP annealings for high-quality LPCVD interpolysilicon dielectric layers. Microelectronics Reliability, 38 (2). pp. 277-280. ISSN 0026-2714

Salm, C. and Klootwijk, J.H. and Ponomarev, Y. and Boos, P.W.M. and Gravesteijn, D.J. and Woerlee, P.H. (1998) Gate Current and Oxide Reliability in p+ Poly MOS Capacitors with Poly-Si and Poly-Ge0.3 Si0.7 Gate Material. IEEE Electron Device Letters, 19 (7). pp. 213-215. ISSN 0741-3106

1996

Klootwijk, J.H. and Verweij, J.F. and Rem, J.B. and Bijlsma, S. (1996) Dielectric breakdown II: Related projects at the University of Twente. Microelectronics Journal, 27 (7). pp. 623-632. ISSN 0026-2692

Klootwijk, J.H. and Weusthof, M.H.H. and Kranenburg, H. van and Woerlee, P.H. and Wallinga, H. (1996) Improvements of deposited interpolysilicon dielectric characteristics with RTP N2O-anneal. IEEE Electron Device Letters, 17 (7). pp. 358-359. ISSN 0741-3106

Verweij, J.F. and Klootwijk, J.H. (1996) Dielectric breakdown I: A review of oxide breakdown. Microelectronics Journal, 27 (7). pp. 611-622. ISSN 0026-2692

This list was generated on Wed Jul 23 05:38:01 2014 CEST.