Author Publications

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Jump to: 2011 | 2009 | 2008 | 2007 | 2006 | 2005
Number of items: 24.

2011

Boogaard, A. and Kovalgin, A.Y. and Wolters, R.A.M. (2011) Negative Charge in Plasma Oxidized SiO2 Layers. ECS Transactions, 35 (4). pp. 259-272. ISSN 1938-5862

Boogaard, Arjen (2011) Plasma-enhanced chemical vapor deposition of silicon dioxide : optimizing dielectric films through plasma characterization. thesis.

2009

Boogaard, A. and Kovalgin, A.Y. and Wolters, R.A.M. (2009) Net Negative Charge in low-temperature SiO2 gate dielectric layers. Microelectronic Engineering, 86 (7-9). pp. 1707-1710. ISSN 0167-9317

Brunets, I. and Boogaard, A. and Smits, S.M. and Vries, H. de and Aarnink, A.A.I. and Holleman, J. and Kovalgin, A.Y. and Schmitz, J. (2009) Low temperature TFTs with poly-stripes. In: Proceedings of the 5th International Thin Film Transistor Conference ITC'09, 5-6 Mar 2009, Palaiseau, France (pp. pp. 62-65).

Brunets, I. and Holleman, J. and Kovalgin, A.Y. and Boogaard, A. and Schmitz, J. (2009) Low-temperature fabricated TFTs on polysilicon stripes. IEEE Transactions on Electron Devices, 56 (8). pp. 1637-1644. ISSN 0018-9383

Kovalgin, A.Y. and Boogaard, A. and Brunets, I. and Aarnink, A.A.I. and Wolters, R.A.M. (2009) Electrical properties of plasma-deposited silicon oxide clarified by chemical modeling. ECS Transactions, 25 (8). pp. 23-32. ISSN 1938-5862

Kovalgin, A.Y. and Boogaard, A. and Wolters, R.A.M. (2009) Impact of small deviations in EEDF on silane-based plasma chemistry. ECS Transactions, 25 (8). pp. 429-436. ISSN 1938-5862

Rajasekharan, B. and Salm, C. and Wolters, R.A.M. and Aarnink, A.A.I. and Boogaard, A. and Schmitz, J. (2009) Metal contacts to lowly doped Si and ultra thin SOI. In: Proceedings of Fifth Workshop of the Thematic Network on Silicon on Insulator Technology, Devices and Circuits, 19-21 Jan 2009, Gotheburg, Sweden (pp. pp. 29-30).

2008

Boogaard, A. and Roesthuis, R. and Brunets, I. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2008) Deposition of High-Quality SiO2 Insulating Films at Low Temperatures by means of Remote PECVD. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands (pp. pp. 452-456).

Brunets, I. and Groenland, A.W. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. (2008) A study of thermal oxidation and plasma-enhanced oxidation/reduction of ALD TiN layers. In: 18th International Conference on Atomical Layer Deposition, ALD 2008, 29 June - 2 July 2008, Bruges, Belgium (pp. P-54).

Brunets, I. and Loon, R.V.A. van and Walters, R.J. and Polman, A. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2008) Light emission from silicon nanocrystals embedded in ALD-alumina at low temperatures. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands (pp. pp. 399-402).

Groenland, A.W. and Brunets, I. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Schmitz, J. (2008) Thermal and plasma-enhanced oxidation of ALD TiN. In: 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2008, 27-28 November 2008, Veldhoven, The Netherlands (pp. pp. 468-471).

2007

Boogaard, A. and Kovalgin, A.Y. and Brunets, I. and Aarnink, A.A.I. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2007) Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD. Surface & Coatings Technology, 201 (22-23). pp. 8976-8980. ISSN 0257-8972

Boogaard, A. and Kovalgin, A.Y. and Brunets, I. and Aarnink, A.A.I. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) On the verification of EEDFs in plasmas with silane using optical emission spectroscopy. ECS Transactions, 6 (1). pp. 259-270. ISSN 1938-5862

Boogaard, A. and Kovalgin, A.Y. and Brunets, I. and Holleman, J. and Schmitz, J. (2007) Optical and Electrical Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD. In: Proceedings of the 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, 29 - 30 Nov 2007, Veldhoven, The Netherlands (pp. pp. 404-407).

Brunets, I. and Aarnink, A.A.I. and Boogaard, A. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) Low-temperature LPCVD of Si nanocrystals from disilane and trisilane (Silcore®) embedded in ALD-alumina for non-volatile memory devices. Surface & Coatings Technology, 201 . pp. 9209-9214. ISSN 0257-8972

Brunets, I. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) Low-temperature process steps for realization of non-volatile memory devices. In: 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), 29-30 Nov 2007, Veldhoven, The Netherlands (pp. pp. 504-508).

Kovalgin, A.Y. and Boogaard, A. and Brunets, I. and Holleman, J. and Schmitz, J. (2007) Chemical modeling of a high-density inductively-coupled plasma reactor containing silane. Surface & Coatings Technology, 201 . pp. 8849-8853. ISSN 0257-8972

2006

Boogaard, A. and Kovalgin, A.Y. and Aarnink, A.A.I. and Wolters, R.A.M. and Holleman, J. and Brunets, I. and Schmitz, J. (2006) Measurement of electron temperatures of Argon Plasmas in a High-Density Inductively-Coupled Remote Plasma System by Langmuir Probe and Optical-Emission Spectroscopy. In: Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006, 23-24 Nov 2006, Veldhoven, The Netherlands (pp. pp. 412-418).

Boogaard, Arjen and Kovalgin, Alexey and Aarnink, Tom and Wolters, Rob and Holleman, Jisk and Brunets, Ihor and Schmitz, Jurriaan (2006) Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD. ECS Transactions, 2 (7). pp. 181-191. ISSN 1938-5862

Brunets, I. and Hemert, T. van and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Schmitz, J. (2006) Memory devices with encapsulated Si nano-crystals: Realization and Characterization. In: Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006, 23-24 Nov 2006, Veldhoven, The Netherlands (pp. pp. 419-422).

Brunets, Ihor and Holleman, Jisk and Kovalgin, Alexey Y. and Aarnink, Tom and Boogaard, Arjen and Oesterlin, Peter (2006) Green Laser Crystallization of a-Si Films Using Preformed a-Si Lines. ECS Transactions, 3 (8). pp. 185-191. ISSN 1938-5862

2005

Aarnink, A.A.I. and Boogaard, A. and Brunets, I. and Isai, I.G. and Kovalgin, A.Y. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2005) A high-density inductively-coupled remote plasma system for the deposition of dielectrics and semiconductors. In: 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005 (SAFE 2005), 17-18 November 2005, Veldhoven, the Netherlands (pp. pp. 67-69).

Brunets, I. and Boogaard, A. and Isai, I.G. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Schmitz, J. (2005) Three-dimensional IC's prolong the life of Moore's law. In: 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005 (SAFE 2005), 17-18 November 2005, Veldhoven, the Netherlands (pp. pp. 76-78).

This list was generated on Mon Sep 22 05:16:53 2014 CEST.