Author Publications

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Jump to: 1993 | 1992 | 1991
Number of items: 7.

1993

Holleman, Jisk and Hasper, Albert and Kleijn, Chris R. (1993) Loading Effects on Kinetical and Electrical Aspects of Silane-Reduced Low-Pressure Chemical Vapor Deposited Selective Tungsten. Journal of the Electrochemical Society, 140 (3). pp. 818-825. ISSN 0013-4651

Schmitz, J.E.J. and Hasper, A. (1993) On the Mechanism of the Step Coverage of Blanket Tungsten Chemical Vapor Deposition. Journal of the Electrochemical Society, 140 (7). pp. 2112-2116. ISSN 0013-4651

1992

Lippe, K. and Hasper, A. and Elfrink, G.W. and Niehof, J. and Kerkhoff, H.G. (1992) A test chip for automatic reliability measurements of interconnect vias. In: 30th Annual International Reliability Physics Symposium, 31 March-2 April 1992 , San Diego, CA (pp. pp. 247-250).

1991

Hasper, A. and Holleman, J. and Middelhoek, J. and Kleijn, C.R. and Hoogendoorn, C.J. (1991) Modeling and Optimization of the Step Coverage of Tungsten LPCVD in Trenches and Contact Holes. Journal of the Electrochemical Society, 138 (6). pp. 1728-1738. ISSN 0013-4651

Holleman, J. and Hasper, A. and Middelhoek, J. (1991) A Reflectometric Study of the Reaction between Si and WF6 during W-LPCVD on Si and of the Renucleation during the H2 Reduction of WF6. Journal of the Electrochemical Society, 138 (3). pp. 783-788. ISSN 0013-4651

Holleman, J. and Hasper, A. and Middelhoek, J. (1991) In Situ Growth Rate Measurement of Selective LPCVD of Tungsten. Journal of the Electrochemical Society, 138 (4). pp. 989-993. ISSN 0013-4651

Kleijn, C.R. and Hoogendoorn, C.J. and Hasper, A. and Holleman, J. and Middelhoek, J. (1991) Transport Phenomena in Tungsten LPCVD in a Single-Wafer Reactor. Journal of the Electrochemical Society, 138 (2). pp. 509-517. ISSN 0013-4651

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