Author Publications

Article

Cuppen, H.M. and Veenendaal van, E. and Suchtelen van, J. and Enckevort van, W.J.P. and Vlieg, E. (2000) A Monte Carlo study of dislocation growth and etching of crystals. Journal of Crystal Growth, 219 (1-2). pp. 165-175. ISSN 0022-0248

Hollander, F.F.A. and Stasse, O. and Suchtelen van, J. and Enckevort van, W.J.P. (2001) Recrystallization phenomena of solution grown paraffin dendrites. Journal of Crystal Growth, 233 (4). pp. 868-880. ISSN 0022-0248

Nijdam, A.J. and Veenendaal van, E. and Cuppen, H.M. and Suchtelen van, J. and Reed, M.L. and Gardeniers, J.G.E. and Enckevort van, W.J.P. and Vlieg, E. and Elwenspoek, M. (2001) Formation and stabilization of pyramidal etch hillocks on silicon in anisotropic etchants: experiments and Monte Carlo simulation. Journal of Applied Physics, 89 (7). pp. 4113-4116. ISSN 0021-8979

Veenendaal van, E. and Beurden van, P. and Enckevort van, W.J.P. and Vlieg, E. and Suchtelen van, J. and Elwenspoek, M. (2000) Monte Carlo study of kinetic smoothing during dissolution and etching of the Kossel (100) and silicon (111) surfaces. Journal of Applied Physics, 88 (8). pp. 4595-4604. ISSN 0021-8979

Veenendaal van, E. and Cuppen, H.M. and Enckevort van, W.J.P. and Suchtelen van, J. and Nijdam, A.J. and Elwenspoek, M. and Vlieg, E. (2001) A monte carlo study of etching in the presence of a mask junction. Journal of Micromechanics and Microengineering, 11 (4). pp. 409-415. ISSN 0960-1317

Veenendaal van, E. and Hoof van, P.J.C.M. and Suchtelen van, J. and Enckevort van, W.J.P. and Bennema, P. (1998) Kinetic roughening of the Kossel (100) surface: comparison of classical criteria with Monte Carlo results. Surface Science, 417 (1). pp. 121-138. ISSN 0039-6028

Veenendaal van, E. and Hoof van, P.J.C.M. and Suchtelen van, J. and Enckevort van, W.J.P. and Bennema, P. (1999) Kinetic roughening of the Kossel (1 0 0) surface. Journal of Crystal Growth, 198-19 (Part 1). pp. 22-26. ISSN 0022-0248

Veenendaal van, E. and Nijdam, A.J. and Suchtelen van, J. and Sato, K. and Gardeniers, J.G.E. and Enckevort van, W.J.P. and Elwenspoek, M. (2000) Simulation of anisotropic wet chemical etching using a physical model. Sensors and Actuators A: Physical, 84 (3). pp. 324-329. ISSN 0924-4247

Veenendaal van, E. and Suchtelen van, J. and Enckevort van, W.J.P. and Sato, K. and Nijdam, A.J. and Gardeniers, J.G.E. and Elwenspoek, M. (2000) The construction of orientation-dependent crystal growth and etch rate functions II: Application to wet chemical etching of silicon in potassium hydroxide. Journal of Applied Physics, 87 (12). pp. 8732-8740. ISSN 0021-8979

Veenendaal van, E. and Theije de, F.K. and Suchtelen van, J. and Enckevort van, W.J.P. (2002) Simulation of step patterns on natural diamond surfaces. Diamond and Related Materials, 11 (2). pp. 145-152. ISSN 0925-9635

Veenendaal van, Erik and Suchtelen van, Jaap and Beurden van, Paul and Cuppen, Herma M. and Enckevort van, Willem J.P. and Nijdam, A. Jasper and Elwenspoek, Miko and Vlieg, Elias (2001) Monte carlo simulation of wet chemical etching of silicon. Sensors and Materials, 13 (6). pp. 343-350. ISSN 0914-4935

Conference or Workshop Item

Nijdam, A.J. and Veenendaal van, E. and Cuppen, H. and Suchtelen van, J. and Reed, M.L. and Gardeniers, J.G.E. and Enckevort van, W.J.P. and Vlieg, E. and Elwenspoek, M.C. (2000) Formation and stabilization of pyramidal etch hillocks on silicon in anisotropic etchants: experiments and Monte Carlo simulation. In: MicroMechanics Europe (MME) 2000, October 1-3, 2000, Uppsala, Sweden .

Suchtelen van, J. and Sato, K. and Veenendaal van, E. and Nijdam, A.J. and Gardeniers, J.G.E. and Enckevort van, W.J.P. and Elwenspoek, M. (1999) Simulation of anisotropic wet-chemical etching using a physical model. In: Twelfth IEEE International Conference on Micro Electro Mechanical Systems, MEMS , January 17-21, 1999, Orlando, Florida, USA.

Veenendaal van, E. and Cuppen, H. and Enckevort van, W.J.P. and Suchtelen van, J. and Nijdam, A.J. and Elwenspoek, M.C. and Vlieg, E. (2000) A Monte Carlo study of etching in the presence of a mask junction. In: MicroMechanics Europe (MME) 2000, October 1-3, 2000, Uppsala, Sweden .