Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

Share/Save/Bookmark

Boogaard, A.J.R. van den and Goor, F.A. van and Louis, E. and Bijkerk, F. (2012) Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection. Optics letters, 37 (2). 160 - 162. ISSN 0146-9592

[img] PDF
Restricted to UT campus only
: Request a copy
173kB
Abstract:A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5  nm ) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100  nm out-of-band radiation in EUV lithography.
Item Type:Article
Copyright:© OSA
Faculty:
Science and Technology (TNW)
Research Group:
Link to this item:http://purl.utwente.nl/publications/82231
Official URL:http://dx.doi.org/10.1364/OL.37.000160
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 288918