Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

Boogaard van den, A.J.R. and Goor van, F.A. and Louis, E. and Bijkerk, F. (2012) Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection. Optics letters, 37 (2). 160 - 162. ISSN 0146-9592

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Abstract:	A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5 nm ) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100 nm out-of-band radiation in EUV lithography.
Item Type:	Article
Copyright:	© OSA
Faculty:	Science and Technology (TNW)
Research Group:	Laser Physics and Nonlinear Optics (LPNO)
Link to this item:	http://purl.utwente.nl/publications/82231
Official URL:	http://dx.doi.org/10.1364/OL.37.000160
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