Hydrogen-induced blistering mechanisms in thin film coatings


Kuznetsov, A. and Gleeson, M.A. and Bijkerk, F. (2012) Hydrogen-induced blistering mechanisms in thin film coatings. Journal of physics: Condensed matter, 24 (5). ISSN 0953-8984

[img] PDF
Restricted to UT campus only
: Request a copy
Abstract:We report on the mechanisms of hydrogen-induced blistering of multilayer coatings. Blister formation is a result of highly localized delamination occurring at the two outermost metal-on-silicon interfaces. The number, size, and type of blisters formed varied depending on the composition and ion energy of the incident flux. The results are explained in terms of the multilayer structure being simultaneously susceptible to blistering via two independent mechanisms. A high density of small blisters developed when relatively energetic (several 100 eV) ions were present. Independently, a hydrogenation process that was facilitated by the presence of a small flux of low energy ions (≤50 eV) induced a low density of large blisters.
Item Type:Article
Copyright:© 2012 IOP Science
Science and Technology (TNW)
Research Chair:
Research Group:
Link to this item:http://purl.utwente.nl/publications/82106
Official URL:https://doi.org/10.1088/0953-8984/24/5/052203
Export this item as:BibTeX
HTML Citation
Reference Manager


Repository Staff Only: item control page

Metis ID: 288911