Sub-50 nm patterning of functional oxides by soft lithographic edge printing

Share/Save/Bookmark

George, A. and Elshof ten, J.E. (2012) Sub-50 nm patterning of functional oxides by soft lithographic edge printing. Journal of materials chemistry, 22 . 9501 - 9504. ISSN 0959-9428

[img]PDF
Restricted to UT campus only
: Request a copy
467Kb
Abstract:We report a fast, versatile and reproducible method to make arbitrary nanoscale patterns of functional metal oxides by edge transfer printing of aqueous metal-loaded water-soluble polyacrylic acid (PAA) solutions on silicon. Patterns of ZnO, CuO, NiO and Fe2O3 with lateral dimensions below 50 nm were realized. The process uses elastomeric PDMS stamps with microscale feature sizes to fabricate nanoscale patterns, so that stamp deformation problems are minimized despite the high resolution.
Item Type:Article
Copyright:© RSC Publishing
Faculty:
Science and Technology (TNW)
Research Group:
Link to this item:http://purl.utwente.nl/publications/81888
Official URL:http://dx.doi.org/10.1039/c2jm31121f
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 288509