Nanoscale Patterning of Organosilane Molecular Thin Films from the Gas Phase and Its Applications: Fabrication of Multifunctional Surfaces and Large Area Molecular Templates for Site-Selective Material Deposition

George, A. and Knez, M. and Hlawacek, G. and Hagedoorn, D. and Verputten, H.H.J. and Gastel van, R. and Elshof ten, J.E. (2012) Nanoscale Patterning of Organosilane Molecular Thin Films from the Gas Phase and Its Applications: Fabrication of Multifunctional Surfaces and Large Area Molecular Templates for Site-Selective Material Deposition. Langmuir, 28 (5). 3045 - 3052. ISSN 0743-7463

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Abstract:	A simple methodology to fabricate micrometer- and nanometer-scale patterned surfaces with multiple chemical functionalities is presented. Patterns with lateral dimensions down to 110 nm were made. The fabrication process involves multistep gas-phase patterning of amine, thiol, alkyl, and fluorinated alkyl-functional organosilane molecules using PDMS molds as shadow masks. Also, a combination process of channel diffused plasma etching of organosilane molecular thin films in combination with masked gas-phase deposition to fabricate multilength scale, multifunctional surfaces is demonstrated.
Item Type:	Article
Copyright:	© 2012 ACS
Faculty:	Science and Technology (TNW)
Research Group:	Inorganic Materials Science (IMS) Physics of Interfaces and Nanomaterials (PIN)
Link to this item:	http://purl.utwente.nl/publications/81878
Official URL:	http://dx.doi.org/10.1021/la204437r
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