Focused-ion-beam nanostructuring of Al$_{2}$O$_{3}$ dielectric layers for photonic applications

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Ay, Feridun and Wörhoff, Kerstin and Ridder, René M. de and Pollnau, Markus (2012) Focused-ion-beam nanostructuring of Al$_{2}$O$_{3}$ dielectric layers for photonic applications. Journal of Micromechanics and Microengineering, 22 (10). p. 105008. ISSN 0960-1317

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Abstract:In this work, we report on utilization and optimization of the focused-ion-beam technique for the fabrication of nanostructures on Al2O3 waveguides for applications in integrated photonic devices. In particular, the investigation of the effects of parameters such as ion-beam current, dwell time, and scanning strategy is addressed. As a result of optimizing these parameters, excellent quality gratings with smooth and uniform sidewalls are reported. The effects of redeposition are minimized and good control of the nanostructuring process is reported. The effect of Ga+ ion implantation during the milling process on the optical performance of the devices is discussed.
Item Type:Article
Copyright:© 2012 IOP Publishing
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/81257
Official URL:http://dx.doi.org/10.1088/0960-1317/22/10/105008
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