Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths

Bayraktar, M. and Wessels, W.A. and Lee, C.J. and Goor van, F.A. and Koster, G. and Rijnders, G. and Bijkerk, F. (2012) Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths. Journal of physics D: applied physics, 45 (49). 494001-1 - 494001-5. ISSN 0022-3727

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Abstract:	We propose an active multilayer mirror structure for EUV wavelengths which can be adjusted to compensate for reflectance changes. The multilayer structure tunes the reflectance via an integrated piezoelectric layer that can change its dimension due to an externally applied voltage. Here, we present design and optimization of the mirror structure for maximum reflectance tuning. In addition, we present preliminary results showing that the deposition of piezoelectric thin films with the requisite layer smoothness and crystal structure are possible. Finally, polarization switching of the smoothest piezoelectric film is presented.
Item Type:	Article
Faculty:	Science and Technology (TNW)
Research Chair:	Nano Electronic Materials (NEM)
Research Group:	Laser Physics and Nonlinear Optics (LPNO) Inorganic Materials Science (IMS)
Link to this item:	http://purl.utwente.nl/publications/81151
Official URL:	http://dx.doi.org/10.1088/0022-3727/45/49/494001
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