Local Doping of Silicon Using Nanoimprint Lithography and Molecular Monolayers

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Voorthuijzen, W. Pim and Yilmaz, M. Deniz and Naber, Wouter J.M. and Huskens, Jurriaan and Wiel van der, Wilfred G. (2011) Local Doping of Silicon Using Nanoimprint Lithography and Molecular Monolayers. Advanced Materials, 23 (11). pp. 1346-1350. ISSN 0935-9648

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Abstract:Micrometer-scale monolayer patterns of a phosphorus-containing molecular precursor are fabricated on nearly intrinsic Si(100) using nanoimprint lithography. The patterned sample is protected by a SiO2capping layer applied by electron beam evaporation and subjected to rapid thermal annealing (RTA) to diffuse the phosphorus dopant atoms into the bulk silicon locally.
Item Type:Article
Copyright:© 2011 Wiley-VCH
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/79196
Official URL:http://dx.doi.org/10.1002/adma.201003625
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