Dimensional Control in Corner Lithography for Wafer-Scale Fabrication of Nano-Apertures


Burouni, Narges and Berenschot, Erwin and Elwenspoek, Miko and Tas, Niels (2011) Dimensional Control in Corner Lithography for Wafer-Scale Fabrication of Nano-Apertures. In: 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011, 20-23 Feb 2011, Kaohsiung, Taiwan (pp. pp. 940-943).

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Abstract:In this paper we investigate a new method to fabricate 3D-oriented nanostructures in wafer scale, and apply it to fabricate a nano-apertures at the apex of a pyramid. A number of new technologies require the use of apertures to serve as electrical, nano fluidic or optical probes. Controlling the size of the aperture is one of the key problems in fabrication process. Our approach is based on corner lithography and offers wafer scale control of the size of the aperture in diameters less than 1µm. We show how to control the size of the nano-aperture by timed isotropic etching of silicon nitride, which serves as a mask for the aperture formation.
Item Type:Conference or Workshop Item
Copyright:© 2011 IEEE
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/78098
Official URL:https://doi.org/10.1109/NEMS.2011.6017509
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