TriPleX tm platform technology for photonic integration: applications from UV through NIR to IR


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Leinse, A. and Heideman, R.G. and Klein, E.J. and Dekker, R. and Roeloffzen, C.G.H. and Marpaung, D.A.I. (2011) TriPleX tm platform technology for photonic integration: applications from UV through NIR to IR. In: ICO International Conference on Information Photonics, IP 2011, 18-20 May 2011, Ottawa, Canada.

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Abstract:The CMOS compatible fabrication equipment, the
transparency from UV to IR and the capability of batch
processing make the TriPleXTM waveguide platform very suitable
for a large variety of applications. In this paper a description of
the technology and examples of applications in different
wavelength ranges are given. These applications exploit the low
loss properties at relatively high index contrasts in the TriPleXTM
technology.
Item Type:Conference or Workshop Item
Copyright:© 2011 IEEE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/78056
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