Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the extreme UV

Tsarfati, Tim and Zoethout, Erwin and Louis, Eric and Kruijs van de, Robbert and Yakshin, Andrey and Müllender, Stephan and Bijkerk, Fred (2009) Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the extreme UV. In: Alternative Lithographic Technologies. Proceedings of SPIE, 7271 . SPIE, 72713V. ISBN 9780819475244

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Abstract:	We present a computational and experimental study on interface passivation of B4C/La multilayers for photolithography at wavelengths beyond 13.5 nm. We successfully applied N-plasma treatment to form interface-localized BN and LaN layers, preventing LaB6 and LaC2 interlayer formation and increasing the optical contrast. Experiments suggest an improvement of absolute reflection by up to 20% for 200 period multilayers, with a best-so-far result of 41.5 % at near-normal incidence of 6.7 nm
Item Type:	Book Section
Copyright:	© 2009 SPIE--The International Society for Optical Engineering
Faculty:	Science and Technology (TNW)
Research Group:	Laser Physics and Nonlinear Optics (LPNO)
Link to this item:	http://purl.utwente.nl/publications/77754
Official URL:	http://dx.doi.org/10.1117/12.824434
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