Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics


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Chen, Juequan and Louis, Eric and Bijkerk, Fred and Lee, Chris J. and Wormeester, Herbert and Kunze, Reinhard and Schmidt, Hagen and Schneider, Dieter and Moors, Roel and Schaik, Willem van and Lubomska, Monika (2009) Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics. In: Alternative Lithographic Technologies. Proceedings of SPIE, 7271 . SPIE, p. 727140. ISBN 9780819475244

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Abstract:Carbon contamination layers, deposited on extreme ultraviolet (EUV) multilayer mirrors during illumination were characterized ex situ using spectroscopic ellipsometry (SE), laser generated surface acoustic waves (LG-SAW), and by their EUV reflectance loss. We show SE is more sensitive to the deposition of carbon layers than the EUV reflectance loss, even in the presence of the highly heterogeneous structure of the multilayer. SE has better overall sensitivity, with a detection limit of 0.2 nm, while LG-SAW has an approximate detection limit < 5 nm
Item Type:Book Section
Copyright:© 2009 COPYRIGHT SPIE--The International Society for Optical Engineering
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/77749
Official URL:http://dx.doi.org/10.1117/12.824435
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