High reflectance multilayers for EUVL HVM-projection optics

Louis, E. and Hattum van, E.D. and Westen van der, S. Alonso and Salle, P. and Grootkarzijn, K.T. and Zoethout, E. and Bijkerk, F. and Blanckenhagen von, G. and Mullender, S. (2010) High reflectance multilayers for EUVL HVM-projection optics. In: Extreme Ultraviolet (EUV) Lithography. Proceedings of SPIE, 7636 . SPIE--The International Society for Optical Engineering, 76362T. ISBN 9780819480507

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Abstract:	Reported is a summary of multilayer deposition results by FOM on three elements of the projection optics of the ASML Extreme UV Lithography HVM tools. The coating process used is e-beam evaporation in combination with low-energy ion-beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 68%, with a maximum value of 69.6% and a non-correctable figure error added by the full multilayer stack of better than 35 picometer. The results are compared to the earlier coatings of the EUVL Process Development Tool
Item Type:	Book Section
Copyright:	© 2010 COPYRIGHT SPIE--The International Society for Optical Engineering
Faculty:	Science and Technology (TNW)
Research Group:	Laser Physics and Nonlinear Optics (LPNO)
Link to this item:	http://purl.utwente.nl/publications/77697
Official URL:	http://dx.doi.org/10.1117/12.846566
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