EUV-multilayers on grating-like topographies


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Boogaard van den, A.J.R. and Louis, E. and Goldberg, K.A. and Mochi, I. and Bijkerk, F. (2010) EUV-multilayers on grating-like topographies. In: Extreme Ultraviolet (EUV) Lithography. Proceedings of SPIE, 7636 . SPIE--The International Society for Optical Engineering, 76362S. ISBN 9780819480507

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Abstract:In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 μm). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources
Item Type:Book Section
Copyright:© 2010 COPYRIGHT SPIE--The International Society for Optical Engineering
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/77696
Official URL:http://dx.doi.org/10.1117/12.846564
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