A single-mask thermal displacement sensor in MEMS


Krijnen, B. and Hogervorst, R.P. and Dijk, J.W. van and Engelen, J.B.C. and Woldering, L.A. and Brouwer, D.M. and Abelmann, L. and Soemers, H.M.J.R. (2011) A single-mask thermal displacement sensor in MEMS. Journal of Micromechanics and Microengineering, 21 (7). 074007-074019. ISSN 0960-1317

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Abstract:This work presents a MEMS displacement sensor based on the conductive heat transfer of a resistively heated silicon structure towards an actuated stage parallel to the structure. This differential sensor can be easily incorporated into a silicon-on-insulator-based process, and fabricated within the same mask as electrostatic actuators and flexure-based stages. We discuss a lumped capacitance model to optimize the sensor sensitivity as a function of the doping concentration, the operating temperature, the heater length and width. We demonstrate various sensor designs. The typical sensor resolution is 2 nm within a bandwidth of 25 Hz at a full scale range of 110 μm.
Item Type:Article
Copyright:© 2011 IOP Publishing
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/77582
Official URL:https://doi.org/10.1088/0960-1317/21/7/074007
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