A single-mask thermal displacement sensor in MEMS

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Krijnen, B. and Hogervorst, R.P. and Dijk, J.W. van and Engelen, J.B.C. and Woldering, L.A. and Brouwer, D.M. and Abelmann, L. and Soemers, H.M.J.R. (2011) A single-mask thermal displacement sensor in MEMS. Journal of Micromechanics and Microengineering, 21 (7). 074007-074019. ISSN 0960-1317

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Abstract:This work presents a MEMS displacement sensor based on the conductive heat transfer of a resistively heated silicon structure towards an actuated stage parallel to the structure. This differential sensor can be easily incorporated into a silicon-on-insulator-based process, and fabricated within the same mask as electrostatic actuators and flexure-based stages. We discuss a lumped capacitance model to optimize the sensor sensitivity as a function of the doping concentration, the operating temperature, the heater length and width. We demonstrate various sensor designs. The typical sensor resolution is 2 nm within a bandwidth of 25 Hz at a full scale range of 110 μm.
Item Type:Article
Copyright:© 2011 IOP Publishing
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/77582
Official URL:http://dx.doi.org/10.1088/0960-1317/21/7/074007
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