Contact resistance measurement structures for high frequencies
Roy, Deepu and Pijper, Ralf M.T. and Tiemeijer, Luuk F. and Wolters, Rob A.M. (2011) Contact resistance measurement structures for high frequencies. In: 24th International Conference on Microelectronic Test Structures, ICMTS, 4-7 April 2011, Amsterdam, the Netherlands (pp. pp. 49-54).
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|Abstract:||Knowledge of the interfacial contact impedance offered by the device at its operating frequency range is crucial for accurate modelling and understanding of the device. In this article, a novel modified TLM test-structure has been devised to extract interfacial contact parameters at frequencies upto 4 GHz.
S-parameter measurements performed on these test-structures were validated with the measurements on identical test-structures suited for conventional DC four point force-sense measurements. Based on these measurements the electrical model for the metalto-PCM interface is derived for different contact impedances.
|Item Type:||Conference or Workshop Item|
|Copyright:||© 2011 IEEE|
Electrical Engineering, Mathematics and Computer Science (EEMCS)
|Link to this item:||http://purl.utwente.nl/publications/77339|
|Export this item as:||BibTeX|
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