Contact resistance measurement structures for high frequencies

Roy, Deepu and Pijper, Ralf M.T. and Tiemeijer, Luuk F. and Wolters, Rob A.M. (2011) Contact resistance measurement structures for high frequencies. In: 24th International Conference on Microelectronic Test Structures, ICMTS, 4-7 April 2011, Amsterdam, the Netherlands.

PDF
Restricted to UT campus only: Request a copy
673Kb

Abstract:	Knowledge of the interfacial contact impedance offered by the device at its operating frequency range is crucial for accurate modelling and understanding of the device. In this article, a novel modified TLM test-structure has been devised to extract interfacial contact parameters at frequencies upto 4 GHz. S-parameter measurements performed on these test-structures were validated with the measurements on identical test-structures suited for conventional DC four point force-sense measurements. Based on these measurements the electrical model for the metalto-PCM interface is derived for different contact impedances.
Item Type:	Conference or Workshop Item
Copyright:	© 2011 IEEE
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Semiconductor Components (SC)
Link to this item:	http://purl.utwente.nl/publications/77339
Export this item as:	BibTeX EndNote HTML Citation Reference Manager

Show download statistics for this publication

Repository Staff Only: item control page