Improved arrayed-waveguide-grating layout avoiding systematic phase errors

Ismail, N. and Sun, Fei and Sengo, Gabriël and Wörhoff, Kerstin and Driessen, Alfred and Ridder de, René M. and Pollnau, Markus (2011) Improved arrayed-waveguide-grating layout avoiding systematic phase errors. Optics Express, 19 (9). pp. 8781-8794. ISSN 1094-4087

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Abstract:	We present a detailed description of an improved arrayed-waveguide-grating (AWG) layout for both, low and high diffraction orders. The novel layout presents identical bends across the entire array; in this way systematic phase errors arising from different bends that are inherent to conventional AWG designs are completely eliminated. In addition, for high-order AWGs our design results in more than 50% reduction of the occupied area on the wafer. We present an experimental characterization of a low-order device fabricated according to this geometry. The device has a resolution of 5.5 nm, low intrinsic losses (< 2 dB) in the wavelength region of interest for the application, and is polarization insensitive over a wide spectral range of 215 nm.
Item Type:	Article
Copyright:	© 2011 Optical Society of America
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Integrated Optical MicroSystems (IOMS)
Link to this item:	http://purl.utwente.nl/publications/76735
Official URL:	http://dx.doi.org/10.1364/OE.19.008781
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