Improved arrayed-waveguide-grating layout avoiding systematic phase errors

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Ismail, N. and Sun, Fei and Sengo, Gabriël and Wörhoff, Kerstin and Driessen, Alfred and Ridder de, René M. and Pollnau, Markus (2011) Improved arrayed-waveguide-grating layout avoiding systematic phase errors. Optics Express, 19 (9). pp. 8781-8794. ISSN 1094-4087

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Abstract:We present a detailed description of an improved arrayed-waveguide-grating (AWG) layout for both, low and high diffraction orders. The novel layout presents identical bends across the entire array; in this way systematic phase errors arising from different bends that are inherent to conventional AWG designs are completely eliminated. In addition, for high-order AWGs our design results in more than 50% reduction of the occupied area on the wafer. We present an experimental characterization of a low-order device fabricated according to this geometry. The device has a resolution of 5.5 nm, low intrinsic losses (< 2 dB) in the wavelength region of interest for the application, and is polarization insensitive over a wide spectral range of 215 nm.
Item Type:Article
Copyright:© 2011 Optical Society of America
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/76735
Official URL:http://dx.doi.org/10.1364/OE.19.008781
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