Direct Patterning of Covalent Organic Monolayers on Silicon Using Nanoimprint Lithography

Share/Save/Bookmark

Voorthuijzen, W. Pim and Yilmaz, M. Deniz and Gomez-Casado, Alberto and Jonkheijm, Pascal and Wiel, Wilfred G. van der and Huskens, Jurriaan (2010) Direct Patterning of Covalent Organic Monolayers on Silicon Using Nanoimprint Lithography. Langmuir, 26 (17). pp. 14210-14215. ISSN 0743-7463

[img] PDF
Restricted to UT campus only
: Request a copy
908kB
Abstract:Two fabrication schemes are reported for the direct patterning of organic monolayers on oxide-free silicon, combining top-down nanoimprint lithography and bottom-up monolayer formation. The first approach was designed to form monolayer patterns on the imprinted areas, while the second approach was designed for monolayer formation outside of the imprinted features. By both approaches, covalently bonded Si-C monolayer patterns with feature sizes ranging from 100 nm to 100 μm were created via a hydrosilylation procedure using diluted reagents. Both unfunctionalized and ω-functionalized alkenes were patterned successfully.
Item Type:Article
Copyright:© 2010 American Chemical Society
Faculty:
Science and Technology (TNW)
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/75556
Official URL:http://dx.doi.org/10.1021/la101445n
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 274010