Roughness evolution of Si surfaces upon Ar ion erosion

Rooij-Lohmann de, V.I.T.A. and Kozhevnikov, I.V. and Peverini, L. and Ziegler, E. and Cuerno, R. and Bijkerk, F. and Yakshin, A.E. (2010) Roughness evolution of Si surfaces upon Ar ion erosion. Applied Surface Science, 256 (16). pp. 5011-5014. ISSN 0169-4332

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Abstract:	We studied the roughness evolution of Si surfaces upon Ar ion erosion in real time. Following the theory of surface kinetic roughening, a model proposed by Majaniemi was used to obtain the value of the dynamic scaling exponent β from our data. The model was found to explain both the observed roughening and the smoothening of the surfaces. The values of the scaling exponents α and β, important for establishing a universal model for ion erosion of (Si) surfaces, have been determined. The value of β proved to increase with decreasing ion energy, while the static scaling exponent α was found to be ion energy independent
Item Type:	Article
Copyright:	© 2010 Elsevier B.V.
Faculty:	Science and Technology (TNW)
Research Group:	Laser Physics and Nonlinear Optics (LPNO)
Link to this item:	http://purl.utwente.nl/publications/75240
Official URL:	http://dx.doi.org/10.1016/j.apsusc.2010.03.045
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