Hydrogen interaction with EUVL-relevant optical materials


Kuznetsov, A.S. and Kruijs, R.W.E. van de and Gleeson, M.A. and Schmid, K. and Bijkerk, F. (2010) Hydrogen interaction with EUVL-relevant optical materials. Journal of Surface Investigation. X-ay, Synchrotron and Neutron Techniques, 4 (4). pp. 563-566. ISSN 1027-4510

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Abstract:Mo/Si multilayer mirrors were exposed to deuterium ions with well-defined energies in order to gain insight into the effects of Extreme UV light driven plasma generation on reflective elements in commercial lithography equipment. Post-irradiation analysis by Rutherford Backscattering Spectrometry showed erosion of both Mo and Si layers for the highest energy 50 eV/D and exposure time 5.4 × 104 s. Nuclear Reaction Analysis revealed detectable deuterium retention for energies ⩾25 eV/D. Surface analysis by X-ray Photoelectron Spectroscopy showed erosion of the first Si layer for energies ⩾5 eV/D. Inferences on the spatial distribution of trapped deuterium are made on the basis of available data regarding deuterium retention in the materials in question
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Copyright:© 2010 Springer
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/75238
Official URL:https://doi.org/10.1134/S1027451010040026
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