Hydrogen interaction with EUVL-relevant optical materials

Kuznetsov, A.S. and Kruijs van de, R.W.E. and Gleeson, M.A. and Schmid, K. and Bijkerk, F. (2010) Hydrogen interaction with EUVL-relevant optical materials. Journal of Surface Investigation. X-ay, Synchrotron and Neutron Techniques, 4 (4). pp. 563-566. ISSN 1027-4510

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Abstract:	Mo/Si multilayer mirrors were exposed to deuterium ions with well-defined energies in order to gain insight into the effects of Extreme UV light driven plasma generation on reflective elements in commercial lithography equipment. Post-irradiation analysis by Rutherford Backscattering Spectrometry showed erosion of both Mo and Si layers for the highest energy 50 eV/D and exposure time 5.4 × 104 s. Nuclear Reaction Analysis revealed detectable deuterium retention for energies ⩾25 eV/D. Surface analysis by X-ray Photoelectron Spectroscopy showed erosion of the first Si layer for energies ⩾5 eV/D. Inferences on the spatial distribution of trapped deuterium are made on the basis of available data regarding deuterium retention in the materials in question
Item Type:	Article
Copyright:	© 2010 Springer
Faculty:	Science and Technology (TNW)
Research Group:	Laser Physics and Nonlinear Optics (LPNO)
Link to this item:	http://purl.utwente.nl/publications/75238
Official URL:	http://dx.doi.org/10.1134/S1027451010040026
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