Deposition kinetics of nanocolloidal gold particles

Share/Save/Bookmark

Brouwer, E.A. Martijn and Kooij, E. Stefan and Hakbijl, Mark and Wormeester, Herbert and Poelsema, Bene (2005) Deposition kinetics of nanocolloidal gold particles. Colloids and Surfaces A: Physicochemical and Engineering Aspects, 267 (1-3). pp. 133-138. ISSN 0927-7757

[img] PDF
Restricted to UT campus only
: Request a copy
276kB
Abstract:The deposition kinetics of the irreversible adsorption of citrate-stabilized, nanocolloidal gold particles on Si/SiO2 surfaces, derivatized with (aminopropyl)triethoxysilane (APTES), is investigated in situ using single wavelength optical reflectometry. A well-defined flow of colloids towards the surface is realized using a radial impinging jet cell geometry. The dynamics of the deposition process is at first mass transport limited. Surface blocking effects determine the adsorption kinetics in the final stage. The entire deposition process can be adequately described in terms of a generalized adsorption theory, which combines the effects of mass-transport and the actual adsorption onto the surface. The diffusion coefficient of the particles is calculated from the initial deposition rate. The obtained value corresponds well with data obtained from experiments described in literature and with the value calculated from the Stokes–Einstein relation.
Item Type:Article
Copyright:© 2005 Elsevier
Faculty:
Science and Technology (TNW)
Research Group:
Link to this item:http://purl.utwente.nl/publications/75170
Official URL:http://dx.doi.org/10.1016/j.colsurfa.2005.06.051
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 227133