Stress development in thin yttrium films on hard substrates during
hydrogen loading

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Dornheim, M. and Pundt, A. and Kirchheim, R. and Molen van der, S.J. and Kooij, E.S. and Kerssemakers, J. and Griessen, R. and Harms, H. and Geyer, U. (2003) Stress development in thin yttrium films on hard substrates during
hydrogen loading.
Journal of Applied Physics, 93 (11). pp. 8958-8965. ISSN 0021-8979

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Abstract:The present drive to make munitions as safe as is feasible and to develop predictive models describing their constitutive response, has led to the development and production of plastic bonded explosives and propellants. There is a range of elastomers used as binder materials with the energetic components. One of these is known as Kel-F-800™ (poly-chloro-trifluroethylene) whose structure is in some ways analogous to that of poly-tetrafluoroethylene (PTFE or Teflon). Thus, it is of interest to assess the mechanical behavior of Teflon and to compare the response of five different production Teflon materials, two of which were produced in pedigree form, one as-received product, and two from previous in-depth literature studies. The equations of state of these variants were quantified by conducting a series of shock impact experiments in which both pressure-particle velocity and shock velocity-particle velocity dependencies were measured. The compressive behavior of Teflon, based upon the results of this study, appears to be independent of the production route and additives introduced.
Item Type:Article
Copyright:© 2003 American Institute of Physics
Link to this item:http://purl.utwente.nl/publications/75157
Official URL:http://dx.doi.org/10.1063/1.1568153
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