Narrow-Linewidth Distributed Feedback Channel Waveguide Laser in Al $_2$ O $_3$ :Er $^{3+}$

Bernhardi, E.H. and Agazzi, L. and Wörhoff, K. and Ridder de, R.M. and Pollnau, M. (2010) Narrow-Linewidth Distributed Feedback Channel Waveguide Laser in Al $_2$ O $_3$ :Er $^{3+}$ . In: Annual Symposium of the IEEE Photonics Benelux Chapter 2010, 18-19 November 2010, Delft, The Netherlands.

Preview

PDF
1414Kb

Abstract:	We report on the fabrication and characterization of a distributed feedback channel waveguide laser in erbium-doped aluminium oxide on a standard thermally oxidized silicon substrate. Holographically-written surface-relief Bragg gratings have been integrated with the aluminium oxide waveguides via reactive ion etching of a silicon dioxide overlay film. The laser operates at a wavelength of 1545.2 nm and exhibits a threshold of 2.2 mW absorbed pump power, while it produces a maximum output power of 3 mW. The emission is TE polarized and has a Lorentzian linewidth of 1.70±0.58 kHz, which corresponds to a Q-factor of 1.14×E11.
Item Type:	Conference or Workshop Item
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Integrated Optical MicroSystems (IOMS)
Link to this item:	http://purl.utwente.nl/publications/74614
Export this item as:	BibTeX EndNote HTML Citation Reference Manager

Show download statistics for this publication

Repository Staff Only: item control page

Narrow-Linewidth Distributed Feedback Channel Waveguide Laser in AlO:Er

Narrow-Linewidth Distributed Feedback Channel Waveguide Laser in Al $_2$ O $_3$ :Er $^{3+}$