Sputtering yields of Ru, Mo, and Si under low energy Ar+ bombardment

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Wu, Shiou-Min and Kruijs, Robbert van de and Zoethout, Erwin and Bijkerk, Fred (2009) Sputtering yields of Ru, Mo, and Si under low energy Ar+ bombardment. Journal of applied physics, 106 (054902). 054902. ISSN 0021-8979

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Abstract:Ion sputtering yields for Ru, Mo, and Si under Ar+ ion bombardment in the near-threshold energy range have been studied using an in situ weight-loss method with a Kaufman ion source, Faraday cup, and quartz crystal microbalance. The results are compared to theoretical models. The accuracy of the in situ weight-loss method was verified by thickness-decrease measurements using grazing incidence x-ray reflectometry, and results from both methods are in good agreement. These results provide accurate data sets for theoretical modeling in the near-threshold sputter regime and are of relevance for (optical) surfaces exposed to plasmas, as, for instance, in extreme ultraviolet photolithography.
Item Type:Article
Copyright:© 2009 American Institute of Physics
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/72900
Official URL:http://dx.doi.org/10.1063/1.3149777
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