Sputtering yields of Ru, Mo, and Si under low energy Ar+ bombardment

Wu, Shiou-Min and Kruijs van de, Robbert and Zoethout, Erwin and Bijkerk, Fred (2009) Sputtering yields of Ru, Mo, and Si under low energy Ar+ bombardment. Journal of applied physics, 106 (054902). 054902. ISSN 00218979

PDF
Restricted to UT campus only: Request a copy
503Kb

Abstract:	Ion sputtering yields for Ru, Mo, and Si under Ar+ ion bombardment in the near-threshold energy range have been studied using an in situ weight-loss method with a Kaufman ion source, Faraday cup, and quartz crystal microbalance. The results are compared to theoretical models. The accuracy of the in situ weight-loss method was verified by thickness-decrease measurements using grazing incidence x-ray reflectometry, and results from both methods are in good agreement. These results provide accurate data sets for theoretical modeling in the near-threshold sputter regime and are of relevance for (optical) surfaces exposed to plasmas, as, for instance, in extreme ultraviolet photolithography.
Item Type:	Article
Copyright:	© 2009 American Institute of Physics
Faculty:	Science and Technology (TNW)
Research Group:	Laser Physics and Nonlinear Optics (LPNO)
Link to this item:	http://purl.utwente.nl/publications/72900
Official URL:	http://dx.doi.org/10.1063/1.3149777
Export this item as:	BibTeX EndNote HTML Citation Reference Manager

Show download statistics for this publication

Repository Staff Only: item control page

Metis ID: 265957