Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication

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Crunteanu, A. and Pollnau, M. and Jänchen, G. and Hibert, C. and Hoffmann, P. and Salathé, R.P. and Eason, R.W. and Shepherd, D.P. (2003) Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication. In: International Conference on Advanced Laser Technologies, ALT'02, 15-20 September 2002, Adelboden, Switzerland.

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Abstract:We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 µm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.
Item Type:Conference or Workshop Item
Copyright:© 2003 SPIE
Link to this item:http://purl.utwente.nl/publications/72461
Official URL:http://dx.doi.org/10.1117/12.543706
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