Structure-related intercalation behaviour of LiCoO2 films

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Bouwman, P.J. and Boukamp, B.A. and Bouwmeester, H.J.M. and Notten, P.H.L. (2002) Structure-related intercalation behaviour of LiCoO2 films. Solid State Ionics, 152-15 . pp. 181-188. ISSN 0167-2738

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Abstract:Submicron films of LiCoO2 have been deposited on silicon and stainless steel substrates using RF sputtering and pulsed laser deposition (PLD). Both films show preferred orientation. RF films have their Li diffusion plane oriented favourably, that is, perpendicular to the surface, while PLD films show a parallel, c-axis orientation. Electrochemical experiments indicate a strong dependence of the intercalation rate on the alignment of the host structure toward the electrolyte solution. Lithographic patterning enhances the inferior intercalation properties of the PLD film on silicon, as does the utilisation of stainless steel substrates.
Item Type:Article
Copyright:Elsevier
Faculty:
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/72246
Official URL:http://dx.doi.org/10.1016/S0167-2738(02)00298-9
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