Pattern Registration Between Spherical Block-Copolymer Domains and Topographical Templates

Cheng, J.Y. and Zhang, F. and Smith, H.I. and Vancso, G.J. and Ross, C.A. (2006) Pattern Registration Between Spherical Block-Copolymer Domains and Topographical Templates. Advanced Materials, 18 (5). pp. 597-601. ISSN 0935-9648

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Abstract:	Pattern registration is achieved in thin films of self-assembling block copolymers by using a topographical template to guide the positions of the polymer domains. The placement accuracy of the polymer domains is related to the edge roughness of the topographical template, and the ultimate placement accuracy is assessed (see Figure). For a block copolymer with spherical morphology, a registered polymer array is achieved by using a two-dimensional template.
Item Type:	Article
Copyright:	© 2006 Wiley InterScience
Faculty:	Science and Technology (TNW)
Research Group:	Materials Science and Technology of Polymers (MTP)
Link to this item:	http://purl.utwente.nl/publications/72190
Official URL:	http://dx.doi.org/10.1002/adma.200501936
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Metis ID: 230354