Fabrication of Freestanding Nanoporous Polyethersulfone Membranes Using Organometallic Polymer Resists Patterned by Nanosphere Lithography

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Acikgoz, Canet and Ling, Xing Yi and Phang, In Yee and Hempenius, Mark A. and Reinhoudt, David N. and Huskens, Jurriaan and Vancso, G. Julius (2009) Fabrication of Freestanding Nanoporous Polyethersulfone Membranes Using Organometallic Polymer Resists Patterned by Nanosphere Lithography. Advanced Materials, 21 (20). pp. 2064-2067. ISSN 0935-9648

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Abstract:Freestanding nanoporous polysulfone membranes are fabricated using nanosphere lithography, in which colloidal silica particles act as a template for the organometallic etch resist, which is composed of poly(ferrocenylsilanes). As shown in the figure, the membranes are robust enough to be removed from the silica wafers where they were produced. They can subsequently be used to separate particles of different sizes.
Item Type:Article
Copyright:© 2009 Wiley InterScience
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/72086
Official URL:http://dx.doi.org/10.1002/adma.200803647
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