Poly(ferrocenylsilanes) as etch barriers in nano and microlithographic applications

Share/Save/Bookmark

Hempenius, Mark A. and Lammertink, Rob G.H. and Peter, Mária and Vancso, G. Julius (2003) Poly(ferrocenylsilanes) as etch barriers in nano and microlithographic applications. Macromolecular Symposia, 196 (1). pp. 45-56. ISSN 1022-1360

[img] PDF
Restricted to UT campus only
: Request a copy
991kB
Abstract:Thin films of organic-organometallic block copolymers are shown to be efficient self-assembled templates for nanolithography. Block copolymers composed of organic blocks such as polyisoprene or polystyrene and a poly(ferrocenylsilane) block microphase separate to form a monolayer of densely packed organometallic spheres in an organic matrix. The high resistance of the organometallic phase to reactive ion etching enables the nanoscale patterns to be transferred into silicon substrates, forming nano structured surfaces. Electrostatic self-assembly of poly(ferrocenylsilane) polyanions and polycations is discussed as a means to form laterally structured organometallic multilayer thin films by area-selective adsorption onto chemically patterned substrates.
Item Type:Article
Copyright:© 2003 Wiley InterScience
Faculty:
Science and Technology (TNW)
Research Group:
Link to this item:http://purl.utwente.nl/publications/71931
Official URL:http://dx.doi.org/10.1002/masy.200390175
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 213183