Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography

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Cheng, Joy Y. and Ross, C.A. and Thomas, Edwin L. and Smith, Henry I. and Vancso, G. Julius (2003) Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography. Advanced Materials, 15 (19). pp. 1599-1602. ISSN 0935-9648

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Abstract:Topographical confinement is used to template the formation of nanoscale domains in a self-assembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example, a sharp edge feature leads to a missing domain and pins the lateral position of the polymer array. (See also inside cover.)
Item Type:Article
Copyright:© 2003 Wiley InterScience
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/71925
Official URL:http://dx.doi.org/10.1002/adma.200305244
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Metis ID: 214934