Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

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Cheng, J.Y. and Ross, C.A. and Chan, V.Z.-H. and Thomas, E.L. and Lammertink, R.G.H. and Vancso, G. Julius (2001) Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography. Advanced Materials, 13 (15). pp. 1174-1178. ISSN 0935-9648

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Abstract:Single-domain cobalt dot arrayswith high magnetic particle density, patterned over large areas (e.g., 10 cm diameter wafers) are fabricated by self-assembled block copolymer lithography, using a polystyrene-poly(ferrocenyldimethylsilane) copolymer as a template. By varying the copolymer type and etching conditions the magnetic properties can be tuned. The Figure shows a typical array of Co dots with tungsten caps obtained via this procedure.
Item Type:Article
Copyright:© 2001 Wiley InterScience
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/71677
Official URL:http://dx.doi.org/10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q
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