Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide


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Crunteanu, A. and Jänchen, G. and Salathé, R.P. and Hoffmann, P. and Pollnau, M. and Eason, R.W. and Shepherd, D.P. (2002) Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide. In: Conference on Lasers and Electro-Optics, CLEO '02, May 16-24, 2002, Long Beach, CA.

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Abstract:We were successful in creating 1.4-µm high ribs in a Ti:sapphire planar waveguide by reactive ion etching. Optical investigations of the obtained structure showed channel-waveguide fluorescence emission of the Ti:sapphire layer after Ar-ion excitation.
Item Type:Conference or Workshop Item
Copyright:© 2002 IEEE
Link to this item:http://purl.utwente.nl/publications/71644
Official URL:http://dx.doi.org/10.1109/CLEO.2002.1033928
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