Nanostructured Thin Films of Organic-Organometallic Block Copolymers: One-Step Lithography with Poly(ferrocenylsilanes) by Reactive Ion Etching

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Lammertink, R.G.H. and Hempenius, M.A. and Enk, J.E. van den and Chan, V.Z.-H. and Thomas, E.L. and Vancso, G.J. (2000) Nanostructured Thin Films of Organic-Organometallic Block Copolymers: One-Step Lithography with Poly(ferrocenylsilanes) by Reactive Ion Etching. Advanced Materials, 12 (2). pp. 98-103. ISSN 0935-9648

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Abstract:The deposition of thin films of inorganic nanoclusters as a route to one-step lithography has been achieved using block copolymers with inherent inorganic (Fe and Si) components. Nanodomains of the organometallic part are resistant to removal during the subsequent O2 etch, which results in well-ordered and separate domains of iron and silicon oxides, as can be seen in the Figure.
Item Type:Article
Copyright:© 2000 Wiley InterScience
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/71627
Official URL:http://dx.doi.org/10.1002/(SICI)1521-4095(200001)12:2<98::AID-ADMA98>3.0.CO;2-5
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