Pore Narrowing and Formation of Ultrathin Yttria-Stabilized Zirconia Layers in Ceramic Membranes by Chemical Vapor Deposition/Electrochemical Vapor Deposition

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Cao, Guo-Zhong and Brinkman, Hendrik W. and Meijerink, Joan and Vries, Karel J. and Burggraaf, Anthonie J. (1993) Pore Narrowing and Formation of Ultrathin Yttria-Stabilized Zirconia Layers in Ceramic Membranes by Chemical Vapor Deposition/Electrochemical Vapor Deposition. Journal of the American Ceramic Society, 76 (9). pp. 2201-2208. ISSN 0002-7820

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Abstract:Chemical vapor deposition (CVD) and electrochemical vapor deposition (EVD) have been applied to deposit yttria-stabilized-zirconia (YSZ) on porous ceramic media. The experimental results indicate that the location of YSZ deposition can be varied from the surface of the substrates to the inside of the substrates by changing the CVD/EVD experimental conditions, i.e., the concentration ratio of the reactant vapors. The deposition width is strongly dependent on the deposition temperature used. The deposition of YSZ inside the pores resulted in pore narrowing and eventually pore closure, which was measured by using permpor-ometry. However, deposition of YSZ on top of porous ceramic substrates (outside the pores) did not result in a reduction of the average pore size. Ultrathin, dense YSZ layers on porous ceramic substrates can be obtained by suppressing the EVD layer growth process after pore closure.
Item Type:Article
Copyright:© 1993 Wiley InterScience
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Link to this item:http://purl.utwente.nl/publications/71006
Official URL:http://dx.doi.org/10.1111/j.1151-2916.1993.tb07755.x
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Metis ID: 106837