Suspended membranes, cantilevers and beams using SU-8 foils

Melai, J. and Blanco Carballo, V.M. and Salm, C. and Schmitz, J. (2010) Suspended membranes, cantilevers and beams using SU-8 foils. Microelectronic Engineering, 87 (5-8). pp. 1274-1277. ISSN 0167-9317

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Abstract:	This paper presents a fast, easy and low-cost method to create suspended structures using SU-8 photoresist. The method consists of laminating SU-8 foils on top of previously defined topographies, followed by SU-8 foil patterning. This surface-micromachining approach has been successfully employed to fabricate a variety of structures, including high-voltage electrodes over CMOS chips, stacked vias, closed cavities, channels, cantilevers and double-clamped beams
Item Type:	Article
Copyright:	© 2010 Elsevier
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Semiconductor Components (SC)
Link to this item:	http://purl.utwente.nl/publications/70169
Official URL:	http://dx.doi.org/10.1016/j.mee.2009.10.035
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