Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide

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Crunteanu, A. and Pollnau, M. and Jänchen, G. and Hibert, C. and Hoffmann, P. and Salathé, R.P. and Eason, R.W. and Grivas, C. and Shepherd, D.P. (2002) Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide. Applied physics B: Lasers and optics, 75 (1). pp. 15-17. ISSN 0946-2171

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Abstract:We report, to our knowledge, the first active channel waveguide in Ti:sapphire. We have created ~1.4-μm high ribs in a ~10-μm thick Ti:sapphire planar waveguide by reactive ion etching. Following excitation by an Ar-ion laser, the rib structure showed channel-waveguide fluorescence emission. The mode profiles and the beam-parameter values (M2) were measured. The coupling efficiency of fluorescence emission into a single-mode fiber was an order of magnitude higher than for fluorescence fromunstructured planar regions of the waveguide. Such devices are of interest as low-threshold tunable lasers and as broadband light sources in low-coherence interferometry.
Item Type:Article
Copyright:© 2002 Springer
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Link to this item:http://purl.utwente.nl/publications/70082
Official URL:http://dx.doi.org/10.1007/s00340-002-0952-2
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