Impact of sidewalls on electrical characterization


Share/Save/Bookmark

Roy, Deepu and Zandt, Micha in 't and Wolters, Rob (2009) Impact of sidewalls on electrical characterization. In: 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE, 26-27 November 2009, Veldhoven, The Netherlands (pp. pp. 105-107).

open access
[img]
Preview
PDF
594kB
Abstract:In this article the impact of sidewalls, formed during reactive ion etching, on the electrical behavior of thin film structures is presented. The presence of sidewalls was experimentally characterized by sheet resistance measurements on Van der Pauw structures. The effect of these sidewalls on the extraction of specific contact resistance from Cross Bridge Kelvin Resistance (CBKR) structures is discussed.
Item Type:Conference or Workshop Item
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/69088
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page