Contact chain measurements for ultrathin conducting films


Groenland, A.W. and Wolters, R.A.M. and Kovalgin, A.Y. and Schmitz, J. (2009) Contact chain measurements for ultrathin conducting films. In: 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE, 26-27 November 2009, Veldhoven, The Netherlands (pp. pp. 150-152).

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Abstract:Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on electrodes on which the ultrathin film is deposited. The contact resistance of the buried electrodes to the ultrathin ALD TiN films is investigated using contact chain structures. This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm in thickness. It is shown that contact chain structures with buried electrodes can be used successfully to characterize the contact resistance to sub 10 nm ALD TiN films
Item Type:Conference or Workshop Item
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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