An investigation of the hydration properties of chemically vapour-deposited silicon dioxide films by means of ellipsometry

Share/Save/Bookmark

Rooij, N.F. de and Sieverdink, R.S.J. and Tromp, R.M. (1977) An investigation of the hydration properties of chemically vapour-deposited silicon dioxide films by means of ellipsometry. Thin Solid Films, 47 (3). pp. 211-218. ISSN 0040-6090

open access
[img]
Preview
PDF
329kB
Abstract:Time-dependent ellipsometric measurements were made of the water absoprtion in SiO2 films grown by chemical vapour deposition at low temperatures. These films were exposed to water vapour at different pressurures. We determined in the ellipsometric volume percentage of water in the oxide film from the changes in the ellipsometric parameters due to water absorption. We also obtained a diffusion coefficient of water of the order of 1.3 x 10-13 cm2 s-1. From the reversible changes in the ellipsometric parameters due to dehydration we conclude that the water is physically adsorbed.
Item Type:Article
Copyright:© 1977 Elsevier Science
Link to this item:http://purl.utwente.nl/publications/68011
Official URL:http://dx.doi.org/10.1016/0040-6090(77)90036-0
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page