High-Resolution Contact Printing with Chemically Patterned Flat Stamps Fabricated by Nanoimprint Lithography

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Duan, Xuexin and Zhao, Yiping and Perl, András and Berenschot, Erwin and Reinhoudt, David N. and Huskens, Jurriaan (2009) High-Resolution Contact Printing with Chemically Patterned Flat Stamps Fabricated by Nanoimprint Lithography. Advanced Materials, 21 (27). pp. 2798-2802. ISSN 0935-9648

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Abstract:Chemically patterned flat stamps provide an effective solution to avoid mechanical stamp-stability problems currently encountered in microcontact printing. A new method is developed to fabricate chemical patterns on a flat PDMS stamp using nanoimprint lithography. Sub-100 nm gold patterns are successfully replicated by these chemically patterned flat PDMS stamps.

Item Type:Article
Copyright:© 2009 Wiley InterScience
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Electrical Engineering, Mathematics and Computer Science (EEMCS)
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/67992
Official URL:http://dx.doi.org/10.1002/adma.200803809
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