High-Resolution Contact Printing with Chemically Patterned Flat Stamps Fabricated by Nanoimprint Lithography
Duan, Xuexin and Zhao, Yiping and Perl, András and Berenschot, Erwin and Reinhoudt, David N. and Huskens, Jurriaan (2009) High-Resolution Contact Printing with Chemically Patterned Flat Stamps Fabricated by Nanoimprint Lithography. Advanced Materials, 21 (27). pp. 2798-2802. ISSN 0935-9648
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| Abstract: | Chemically patterned flat stamps provide an effective solution to avoid mechanical stamp-stability problems currently encountered in microcontact printing. A new method is developed to fabricate chemical patterns on a flat PDMS stamp using nanoimprint lithography. Sub-100 nm gold patterns are successfully replicated by these chemically patterned flat PDMS stamps.
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| Item Type: | Article |
| Copyright: | © 2009 Wiley InterScience |
| Faculty: | Electrical Engineering, Mathematics and Computer Science (EEMCS) Science and Technology (TNW) |
| Research Group: | |
| Link to this item: | http://purl.utwente.nl/publications/67992 |
| Official URL: | http://dx.doi.org/10.1002/adma.200803809 |
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